SCHEMBL4613872

SCHEMBL4613872

CSSSCCCCS(=O)(=O)O

nearest known ligand 0.38

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.38
PTGS1 P23219 1/20 0.31
PDE4A P27815 1/20 0.31
LMNA P02545 1/20 0.31
SLC6A6 P31641 1/20 0.31
CYP2C19 P33261 1/20 0.31
BLM P54132 1/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL458345 0.94 APP (0.39) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL17819146 0.92 APP (0.38) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL518982 0.82 APP (0.48) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL422953 0.80 APP (0.42) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL13417438 0.80 APP (0.46) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL16499985 0.80 APP (0.46) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL28767276 0.80 APP (0.46) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL856905 0.80 APP (0.46) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL16500026 0.80 APP (0.46) APPPTGS1PDE4ALMNASLC6A6
SCHEMBL17819134 0.78 APP (0.41) APPPTGS1PDE4ALMNASLC6A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080142370-A1 Aqueous, Acidic Solution and Method for Electrolytically Depositing Copper Coatings as Well as Use of Said Solution ATOTECH DEUTSCHLAND GMBH (DE) 2008-06-19 US claimed
EP-1651801-B1 AQUEOUS, ACIDIC SOLUTION AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER COATINGS AS WELL AS USE OF SAID SOLUTION ATOTECH DEUTSCHLAND GMBH (DE) 2008-01-23 EP claimed
EP-0785297-B1 An aqueous acid bath for the electrodeposition of a shiny and tear-free copper coating and its application ATOTECH DEUTSCHLAND GMBH (DE) 2000-01-05 EP claimed
EP-0554275-B1 ACID BATH FOR COPPER PLATING, AND A PROCESS USING A BATH OF THIS TYPE FOR THIS PURPOSE ATOTECH DEUTSCHLAND GMBH (DE) 1994-12-14 EP claimed
EP-0297306-B1 AQUEOUS ACID BATH FOR THE GALVANIC DEPOSITION OF BRIGHTENING AND LEVELING COPPER COATINGS SCHERING AKTIENGESELLSCHAFT (DE) 1993-01-20 EP claimed
US-4975159-A Copper salt, inorganic acid and alkoxylated lactam; reinforcing electroconductivity of printed circuit SCHERING AKTIENGESELLSCHAFT (DE) 1990-12-04 US claimed
US-20080142370-A1 Aqueous, Acidic Solution and Method for Electrolytically Depositing Copper Coatings as Well as Use of Said Solution ATOTECH DEUTSCHLAND GMBH (DE) 2008-06-19 US disclosed
EP-1651801-B1 AQUEOUS, ACIDIC SOLUTION AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER COATINGS AS WELL AS USE OF SAID SOLUTION ATOTECH DEUTSCHLAND GMBH (DE) 2008-01-23 EP disclosed
US-4975159-A Copper salt, inorganic acid and alkoxylated lactam; reinforcing electroconductivity of printed circuit SCHERING AKTIENGESELLSCHAFT (DE) 1990-12-04 US disclosed