Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.52 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | HPRT1 | P00492 | 2/20 | 0.48 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.42 |
| ▸ | F12 | P00748 | 1/20 | 0.40 |
| ▸ | PLAU | P00749 | 1/20 | 0.40 |
| ▸ | NCF1 | P14598 | 1/20 | 0.40 |
| ▸ | NOS3 | P29474 | 1/20 | 0.40 |
| ▸ | NOS1 | P29475 | 1/20 | 0.40 |
| ▸ | NOS2 | P35228 | 1/20 | 0.40 |
| ▸ | BACE1 | P56817 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31390038 | 0.75 | ALDH1A1 (0.56) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| 1,2-Naphthoquinone SCHEMBL2146624 | 0.75 | ALDH1A1 (0.55) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| SCHEMBL29418178 | 0.75 | ALDH1A1 (0.56) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| SCHEMBL455943 | 0.75 | ALDH1A1 (0.56) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| SCHEMBL64806 | 0.75 | ALDH1A1 (0.56) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| Formaldehyde SCHEMBL28941694 | 0.74 | ALDH1A1 (0.50) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| Hydrochloric Acid SCHEMBL31439257 | 0.73 | ALDH1A1 (0.54) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| SCHEMBL31633515 | 0.73 | ALDH1A1 (0.54) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| SCHEMBL31633516 | 0.73 | ALDH1A1 (0.54) | ALDH1A1HSD17B10TSHRCYP3A4HPGD | |
| Hydrochloric Acid SCHEMBL430346 | 0.73 | ALDH1A1 (0.54) | ALDH1A1HSD17B10TSHRCYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | claimed |
| JP-1027648-A | — | — | None | — | — | JP | disclosed |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3257835-A1 | COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-3239141-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-11-01 | — | — | EP | disclosed |
| CN-103476745-B | Diamine compound containing sulfonic acid group and method for producing same | NITTO DENKO CORP. (JP) | 2015-09-30 | — | — | CN | disclosed |
| CN-102341701-B | Mimetics of normal fresh platelets | BIO RAD LABORATORIES | 2014-07-09 | — | — | CN | disclosed |
| CN-103476832-A | Polyimide, polyimide polymer electrolyte membrane, membrane electrode assembly, and solid polymer fuel cell | NITTO DENKO CORP | 2013-12-25 | — | — | CN | disclosed |
| CN-101258147-B | 4-piperazin-1-yl-4-benzo [ B ] thiophene derivatives for the treatment of CNS disorders | OTSUKA PHARMA CO LTD | 2012-03-21 | — | — | CN | disclosed |
| CN-102341701-A | Mimetics of normal fresh platelets | BIO RAD LABORATORIES | 2012-02-01 | — | — | CN | disclosed |
| CN-101868563-A | Base processing agent for metal material and method for processing base for metal material | NIHON PARKERIZING | 2010-10-20 | — | — | CN | disclosed |
| CN-101258147-A | 4-piperazin-1-yl-4-benzo [ B ] thiophene derivatives for the treatment of CNS disorders | OTSUKA PHARMA CO LTD (JP) | 2008-09-03 | — | — | CN | disclosed |
| EP-1919907-A2 | HETEROCYCLIC COMPOUND | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2008-05-14 | — | — | EP | disclosed |
| WO-2007026959-A2 | DERIVATIVES OF 4-PIPERAZIN-1-YL-4-BENZ0 [B] THIOPHENE SUITABLE FOR THE TREATMENT OF CNS DISORDERS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2007-03-08 | — | — | WO | disclosed |
| US-6057336-A | ANTIINFLAMMATORY AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-05-02 | — | — | US | disclosed |
| US-5629406-A | AMINO ACID DERIVATIVES | SANKYO COMPANY, LIMITED (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0587311-A1 | Peptides capable of inhibiting the activity of HIV protease, their preparation and their therapeutic use | SANKYO COMPANY LIMITED (JP) | 1994-03-16 | — | — | EP | disclosed |
| JP-S6427648-A | METHOD OF REFINING ALKALINE SOLUTION | SUMITOMO CHEMICAL CO | 1989-01-30 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | ASH2L, MLLT1, FRG1 | ALDH1A1 1912/4885HSD17B10 1750/4885TSHR 3984/4885 |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | PRMT9, ARGLU1, MLLT1 | ALDH1A1 1309/4885HSD17B10 3367/4885TSHR 2806/4885 |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | ASH2L, MLLT1, FRG1 | ALDH1A1 1912/4885HSD17B10 1750/4885TSHR 3984/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.