Silicate

Silicate

SCHEMBL463345

N.O.O=[Si](O)O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Silicate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silicate SCHEMBL20720570 1.00
Silicate SCHEMBL4004000 1.00
Silicate SCHEMBL6394282 0.94
Silicate SCHEMBL7593137 0.94
Silicate SCHEMBL6417887 0.94
Silicate SCHEMBL9309159 0.94
Silicate SCHEMBL4726242 0.94
Silicate SCHEMBL10951394 0.94
Silicate SCHEMBL11706682 0.94
Silicate SCHEMBL14892770 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118221940-A Photo-curable hyperbranched organic silicon resin and photo-curable inkjet ink prepared from photo-curable hyperbranched organic silicon resin 上海极紫科技有限公司 2024-06-21 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
US-20120018109-A1 White Tinting File Folder INTERNATIONAL PAPER COMPANY (US) 2012-01-26 US claimed
US-7484679-B2 Method of milling cerium compound by means of ball mill NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-02-03 US claimed
US-20050253001-A1 Cerium compound milling method using ball mill NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-11-17 US claimed
CN-118221940-A Photo-curable hyperbranched organic silicon resin and photo-curable inkjet ink prepared from photo-curable hyperbranched organic silicon resin 上海极紫科技有限公司 2024-06-21 CN disclosed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN disclosed
US-20120018109-A1 White Tinting File Folder INTERNATIONAL PAPER COMPANY (US) 2012-01-26 US disclosed
US-7484679-B2 Method of milling cerium compound by means of ball mill NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-02-03 US disclosed
US-20080156908-A1 Method of milling cerium compound by means of ball mill NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-07-03 US disclosed
CN-100337925-C Crystalline ceria sol and method for producing same NISSAN CHEMICAL IND LTD (JP) 2007-09-19 CN disclosed
US-20050253001-A1 Cerium compound milling method using ball mill NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-11-17 US disclosed
US-6890857-B2 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion, and method for fabricating the same RENESAS TECHNOLOGY CORP. (JP) 2005-05-10 US disclosed
US-6685889-B1 Photochemical catalysts and methods for their manufacture and use PURDUE RESEARCH FOUNDATION 2004-02-03 US disclosed
US-20030052339-A1 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion, and method for fabricating the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2003-03-20 US disclosed
US-6476491-B2 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion and method for fabricating the same MITSUBISHI DENKI KABUSHIKI KAIHSA (JP) 2002-11-05 US disclosed
CN-1371867-A Crystalline ceria sol and method for producing same NISSAN CHEMICAL IND LTD (JP) 2002-10-02 CN disclosed
US-20010008311-A1 Semiconductor device and method for fabricating the same and apparatus for chemical mechanical polishing and method of chemical mechanical polishing MITSUBISHI DENKI KABUSHIKI KAISHA 2001-07-19 US disclosed