Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4643088 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL93155 | 1.00 | — | — | |
| SCHEMBL2281821 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL4641274 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL4641353 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL1481861 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL4641445 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL93131 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL2277028 | 1.00 | TSHR (0.33) | TSHR | |
| SCHEMBL4646590 | 1.00 | TSHR (0.33) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11924979-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-05 | — | — | US | disclosed |
| US-20230406987-A1 | THERMOPLASTIC POLYURETHANE, RESIN COMPOSITION CONTAINING THE SAME, AND MOLDED PRODUCT OBTAINED THEREFROM | BASE SE (DE) | 2023-12-21 | — | — | US | disclosed |
| EP-4251671-A2 | THERMOPLASTIC POLYURETHANE, RESIN COMPOSITION CONTAINING THE SAME, AND MOLDED PRODUCT OBTAINED THEREFROM | BASF SE (DE) | 2023-10-04 | — | — | EP | disclosed |
| CN-112004889-B | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device | 三菱瓦斯化学株式会社 | 2022-12-09 | — | — | CN | disclosed |
| WO-2022112280-A2 | THERMOPLASTIC POLYURETHANE, RESIN COMPOSITION CONTAINING THE SAME, AND MOLDED PRODUCT OBTAINED THEREFROM | BASF SE (DE) | 2022-06-02 | — | — | WO | disclosed |
| US-11185851-B2 | Polymer-supported metal | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20210147629-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-05-20 | — | — | US | disclosed |
| EP-3786233-A1 | RESIN COMPOSITION, LAMINATE, RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR WAFER, SUBSTRATE FOR MOUNTING RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-03 | — | — | EP | disclosed |
| CN-112004889-A | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device | 三菱瓦斯化学株式会社 | 2020-11-27 | — | — | CN | disclosed |
| EP-3417939-A1 | METAL-SUPPORTED MACROMOLECULE | Takasago International Corporation (JP) | 2018-12-26 | — | — | EP | disclosed |
| US-9611279-B2 | Zinc complex | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160002268-A1 | ZINC COMPLEX | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| EP-1443042-B1 | HYBRID ONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-7101918-B2 | Hybrid type onium salt | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-05 | — | — | US | disclosed |
| US-20050020710-A1 | Hybrid onium salt | WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-4088583-A | WATER, GAS, FOAMING AGENT, EROSION AND CORROSION INHIBITOR, CARBOXYALKYL CELLULOSE ETHER OR POLYALKYLENE OXIDE POLYMER | UNION OIL COMPANY OF CALIFORNIA (US) | 1978-05-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160002268-A1 | ZINC COMPLEX | SLC39A11, SLC39A3, SOD1 | TSHR 1458/4885 |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | RER1, FGFR1, NHERF1 | TSHR 550/4885 |
| US-11185851-B2 | Polymer-supported metal | SOD1, PCNA, MAX | TSHR 3411/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.