Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCHE | P06276 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
| ▸ | CRBN | Q96SW2 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1402882 | 0.94 | CRBN (0.33) | CRBNALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL4645405 | 0.88 | CRBN (0.31) | CRBNALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL4648441 | 0.85 | CRBN (0.33) | CRBN | |
| SCHEMBL14209991 | 0.84 | CRBN (0.44) | CRBNALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL2769336 | 0.82 | KMT2A (0.34) | KMT2A | |
| SCHEMBL4645049 | 0.80 | MMP2 (0.38) | BCHEACHEALDH1A1 | |
| SCHEMBL13346088 | 0.80 | ALDH1A1 (0.37) | ALDH1A1 | |
| SCHEMBL1402639 | 0.78 | SLC11A2 (0.36) | ACHECRBNALDH1A1LMNAHTT | |
| SCHEMBL1402519 | 0.73 | CYP1A2 (0.36) | ACHE | |
| SCHEMBL6601719 | 0.72 | CRBN (0.30) | CRBN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |