SCHEMBL4648441

SCHEMBL4648441

c1cc(Sc2ccc(CSCC3CS3)cc2)ccc1CSCC1CS1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CRBN Q96SW2 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402882 0.90 CRBN (0.33) CRBN
SCHEMBL4645405 0.85 CRBN (0.31) CRBN
SCHEMBL4646933 0.85 BCHE (0.34) CRBN
SCHEMBL14209991 0.81 CRBN (0.44) CRBN
SCHEMBL2769336 0.79 KMT2A (0.34)
SCHEMBL4645049 0.77 MMP2 (0.38)
SCHEMBL13346088 0.77 ALDH1A1 (0.37)
SCHEMBL1402747 0.76 NR1H2 (0.32) CRBN
SCHEMBL1402639 0.76 SLC11A2 (0.36) CRBN
SCHEMBL1402519 0.71 CYP1A2 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed