SCHEMBL4645049

SCHEMBL4645049

O=S(=O)(c1ccc(CSCC2CS2)cc1)c1ccc(CSCC2CS2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 14/20 0.38
MMP9 P14780 14/20 0.38
MMP14 P50281 12/20 0.38
MMP8 P22894 9/20 0.38
MMP7 P09237 5/20 0.38
MMP3 P08254 4/20 0.38
CA12 O43570 2/20 0.38
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
CA3 P07451 2/20 0.38
CA4 P22748 2/20 0.38
CA6 P23280 2/20 0.38
CA5A P35218 2/20 0.38
CA7 P43166 2/20 0.38
CA9 Q16790 2/20 0.38
CA13 Q8N1Q1 2/20 0.38
CA14 Q9ULX7 2/20 0.38
CA5B Q9Y2D0 2/20 0.38
MMP1 P03956 2/20 0.35
ADAM17 P78536 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402882 0.86 CRBN (0.33) ALDH1A1
SCHEMBL4646933 0.80 BCHE (0.34) ALDH1A1BCHEACHE
SCHEMBL4645405 0.80 CRBN (0.31) ALDH1A1
SCHEMBL4648441 0.77 CRBN (0.33)
SCHEMBL28997268 0.77 RECQL (0.39) ALDH1A1GAA
SCHEMBL14209991 0.77 CRBN (0.44) ALDH1A1GAA
SCHEMBL4647523 0.77 MMP2 (0.43) MMP2MMP9MMP14MMP8MMP7
SCHEMBL1402877 0.76 MMP2 (0.36) MMP2MMP9MMP14MMP8MMP7
SCHEMBL4863527 0.75 HDAC1 (0.32)
SCHEMBL2769336 0.75 KMT2A (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed