SCHEMBL4647065

SCHEMBL4647065

CC(C)(c1ccc(CSCC2CS2)cc1)c1ccc(CSCC2CS2)cc1

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.32
TSHR P16473 3/20 0.32
TP53 P04637 2/20 0.32
MAPT P10636 2/20 0.32
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
ALDH1A1 P00352 1/20 0.32
PPARG P37231 1/20 0.32
HIF1A Q16665 1/20 0.32
ESR1 P03372 1/20 0.31
CYP3A4 P08684 1/20 0.31
AR P10275 1/20 0.31
SLC6A2 P23975 1/20 0.31
SLC6A4 P31645 1/20 0.31
HTR6 P50406 1/20 0.31
ESRRG P62508 1/20 0.31
SLC6A3 Q01959 1/20 0.31
ESR2 Q92731 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402882 0.86 CRBN (0.33) MEN1CYP1A2KMT2AALDH1A1CRBN
SCHEMBL4646933 0.80 BCHE (0.34) KMT2AALDH1A1CRBN
SCHEMBL4645405 0.80 CRBN (0.31) TSHRKMT2AALDH1A1ESR1CYP3A4
SCHEMBL4648441 0.77 CRBN (0.33) CRBN
SCHEMBL14209991 0.77 CRBN (0.44) MAPTCYP1A2KMT2AALDH1A1CYP3A4
SCHEMBL4650286 0.77 TSHR (0.37) HPGDTSHRTP53MAPTMEN1
SCHEMBL7945997 0.76 LTA4H (0.31) ALDH1A1
SCHEMBL1402611 0.76 ALDH1A1 (0.34) HPGDTSHRTP53MAPTMEN1
SCHEMBL2769336 0.75 KMT2A (0.34) KMT2A
SCHEMBL4863527 0.75 HDAC1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed