SCHEMBL4657709

SCHEMBL4657709

Nc1ccc(C2(c3ccc(N)cc3)c3ccccc3-c3c(C(=O)O)cccc32)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.58
KMT2A Q03164 4/20 0.58
LMNA P02545 3/20 0.58
MAPT P10636 3/20 0.58
KDM4E B2RXH2 1/20 0.58
OPRK1 P41145 1/20 0.58
SMN1; SMN2 Q16637 1/20 0.58
ALDH1A1 P00352 4/20 0.43
MYC P01106 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
PDK2 Q15119 6/20 0.42
HNF4A P41235 1/20 0.41
POLB P06746 3/20 0.40
HSD17B10 Q99714 1/20 0.39
NPC1 O15118 1/20 0.39
GAA P10253 1/20 0.39
RAB9A P51151 1/20 0.39
GFER P55789 1/20 0.39
THRB P10828 1/20 0.36
MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31198543 1.00 MEN1 (0.58) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL9220275 0.87 HNF4A (0.45) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL9557304 0.84 MEN1 (0.60) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL5968745 0.84 PDK2 (0.56) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL6869548 0.83 ALDH1A1 (0.51) MEN1KMT2ALMNAMAPTALDH1A1
SCHEMBL9549747 0.82 ESR1 (0.47) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL5968721 0.81 MYC (0.49) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL22862273 0.79 DDAH1 (0.42) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL31275905 0.78 ESR1 (0.66) MEN1KMT2ALMNAMAPTKDM4E
SCHEMBL4660239 0.77 MEN1 (0.68) MEN1KMT2ALMNAMAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024204336-A1 RESIN COMPOSITION, CURED ARTICLE, SUBSTRATE WITH CURED ARTICLE, LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 東レ株式会社 2024-10-03 WO disclosed
WO-2024204181-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 東レ株式会社 2024-10-03 WO disclosed
EP-4397731-A1 ADHESIVE, SUBSTRATE HAVING ADHESIVE, CIRCUIT BOARD HAVING ADHESIVE LAYER, LAYERED PRODUCT, METHOD FOR PRODUCING LAYERED PRODUCT, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Toray Industries, Inc. (JP) 2024-07-10 EP disclosed
US-11787905-B2 Polyamide compound TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) 2023-10-17 US disclosed
WO-2023032888-A1 ADHESIVE, SUBSTRATE HAVING ADHESIVE, CIRCUIT BOARD HAVING ADHESIVE LAYER, LAYERED PRODUCT, METHOD FOR PRODUCING LAYERED PRODUCT, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 東レ株式会社 2023-03-09 WO disclosed
US-11186757-B2 Resin composition, resin layer, permanent adhesive, adhesive for temporary bonding, laminated film, processed wafer, and method for manufacturing electronic component or semiconductor device TORAY INDUSTRIES, INC. (JP) 2021-11-30 US disclosed
US-20210139700-A1 RESIN COMPOSITION, RESIN LAYER, PERMANENT ADHESIVE, ADHESIVE FOR TEMPORARY BONDING, LAMINATED FILM, PROCESSED WAFER, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2021-05-13 US disclosed
US-10941320-B2 Adhesive for temporary bonding, adhesive layer, wafer work piece and method for manufacturing semiconductor device using same, rework solvent, polyimide copolymer, polyimide mixed resin, and resin compostion TORAY INDUSTRIES, INC. (JP) 2021-03-09 US disclosed
EP-3187559-B1 ADHESIVE FOR TEMPORARY BONDING, ADHESIVE LAYER, METHOD FOR MANUFACTURING WAFER WORK PIECE AND SEMICONDUCTOR DEVICE USING SAME, REWORK SOLVENT, POLYIMIDE COPOLYMER, POLYIMIDE MIXED RESIN, AND RESIN COMPOSITION TORAY INDUSTRIES (JP) 2021-02-17 EP disclosed
EP-2902447-B1 RESIN COMPOSITION, CURED FILM, LAMINATED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2020-10-28 EP disclosed
EP-2902447-A1 RESIN COMPOSITION, CURED FILM, LAMINATED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Toray Industries, Inc. (JP) 2015-08-05 EP disclosed
EP-2735580-A1 POLYIMIDE RESIN, RESIN COMPOSITION AND LAMINATED FILM THAT USE SAME Toray Industries, Inc. (JP) 2014-05-28 EP disclosed
US-8668992-B2 Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients BREWER SCIENCE INC. (US) 2014-03-11 US disclosed
US-20120308835-A1 FLUORINATED POLYIMIDES WITH FLUORENE CARDO STRUCTURE AS OPTICAL MATERIALS THAT HAVE LOW ABSOLUTE THERMO-OPTIC COEFFICIENTS BREWER SCIENCE INC. (US) 2012-12-06 US disclosed
EP-1739114-B1 POLYIMIDE RESIN, MULTILAYER FILM, MULTILAYER FILM WITH METAL LAYER, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2008-12-17 EP disclosed
US-20070260035-A1 Polyimide Resin, Laminate Film, Metal Layer-Bearing Laminate Film, and Semiconductor Device TORAY INDUSTRIES, INC. (JP) 2007-11-08 US disclosed
EP-1739114-A1 POLYIMIDE RESIN, MULTILAYER FILM, MULTILAYER FILM WITH METAL LAYER, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2007-01-03 EP disclosed
EP-1213049-B1 GAS SEPARATION MEMBRANE AND PROCESS FOR PRODUCING A POLYMER NAT INST OF ADVANCED IND SCIEN (JP) 2006-11-15 EP disclosed
US-6531569-B1 Halogenated polyimides having heat and chemical resistance used as permselective membranes NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-03-11 US disclosed
EP-1213049-A1 RESIN MATERIAL FOR GAS SEPARATION BASE AND PROCESS FOR PRODUCING THE SAME National Institute of Advanced Industrial Science and Technology (JP) 2002-06-12 EP disclosed