SCHEMBL467601

SCHEMBL467601

CN1CCC(C2CCN(c3ccc(-n4nc(N)nc4N)cc3F)CC2)CC1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FLT3 P36888 1/20 0.36
AXL P30530 7/20 0.36
ALDH1A1 P00352 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
TTK P33981 1/20 0.35
MAPT P10636 2/20 0.34
MAPK1 P28482 2/20 0.34
LMNA P02545 1/20 0.34
GFER P55789 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
KDM4E B2RXH2 2/20 0.34
GAA P10253 2/20 0.34
HTT P42858 1/20 0.34
RECQL P46063 1/20 0.34
PTK2B Q14289 1/20 0.34
HRH4 Q9H3N8 2/20 0.33
KDR P35968 2/20 0.33
INSR P06213 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18009413 0.89 ALDH1A1 (0.46) FLT3AXLALDH1A1L3MBTL1TTK
SCHEMBL467696 0.88 AXL (0.43) AXLALDH1A1L3MBTL1KDRINSR
SCHEMBL28784752 0.83 HRH3 (0.39) AXLALDH1A1MAPTMAPK1LMNA
SCHEMBL27791062 0.83 CHRNB2 (0.32) AXLTTKKDRINSR
SCHEMBL467659 0.82 AXL (0.49) AXLALDH1A1L3MBTL1MAPTMAPK1
SCHEMBL467537 0.81 CHIT1 (0.36) AXLALDH1A1MAPTMAPK1LMNA
SCHEMBL27769791 0.81 ALDH1A1 (0.37) AXLALDH1A1MAPTMAPK1LMNA
SCHEMBL467478 0.81 AXL (0.42) AXLALDH1A1MAPTMAPK1KDM4E
SCHEMBL28784754 0.80 DRD2 (0.38) MAPTGAA
SCHEMBL13276198 0.80 ADORA2A (0.40) AXLALDH1A1MAPTMAPK1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2387395-A1 AXL INHIBITORS FOR USE IN COMBINATION THERAPY FOR PREVENTING, TREATING OR MANAGING METASTATIC CANCER Rigel Pharmaceuticals, Inc. (US) 2011-11-23 EP disclosed
US-8040491-B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method NIKON CORPORATION (JP) 2011-10-18 US disclosed