Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | GPX4 | P36969 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | ATM | Q13315 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4686269 | 0.83 | GPX4 (0.31) | ALDH1A1KDM4EMAPK1HPGDHSD17B10 | |
| SCHEMBL4689470 | 0.79 | POLB (0.30) | POLB | |
| SCHEMBL4687098 | 0.78 | GPX4 (0.34) | ALDH1A1KDM4EMAPK1HPGDHSD17B10 | |
| SCHEMBL4692317 | 0.77 | MAPK1 (0.31) | MAPK1POLB | |
| SCHEMBL3803250 | 0.77 | GPX4 (0.33) | ALDH1A1KDM4EMAPK1HPGDHSD17B10 | |
| SCHEMBL24670441 | 0.76 | MAPK1 (0.30) | MAPK1 | |
| SCHEMBL3809880 | 0.76 | GPX4 (0.33) | ALDH1A1KDM4EMAPK1HPGDHSD17B10 | |
| SCHEMBL19012506 | 0.76 | MAPK1 (0.49) | TSHRALDH1A1KDM4EMAPK1HPGD | |
| SCHEMBL70883 | 0.76 | MAPK1 (0.49) | TSHRALDH1A1KDM4EMAPK1HPGD | |
| SCHEMBL179670 | 0.75 | KDM4E (0.37) | ALDH1A1KDM4EGPX4POLBATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10310376-B2 | Resist composition, pattern forming process, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-04 | — | — | US | disclosed |
| EP-3184561-B1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | SHINETSU CHEMICAL CO (JP) | 2018-10-31 | — | — | EP | disclosed |
| US-20170184967-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| EP-3184561-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-06-28 | — | — | EP | disclosed |
| EP-1352904-B1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | MITSUBISHI RAYON CO (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7339014-B2 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-04 | — | — | US | disclosed |
| US-7041838-B2 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI RAYON CO., LTD. (JP) | 2006-05-09 | — | — | US | disclosed |
| US-20050113538-A1 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO.,LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170184967-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | EEF1D, EEF1G, RPL14 | TSHR 4709/4885ALDH1A1 1397/4885KDM4E 447/4885 |
| US-10310376-B2 | Resist composition, pattern forming process, polymer, and monomer | EEF1D, EEF1G, RPL14 | TSHR 4709/4885ALDH1A1 1397/4885KDM4E 447/4885 |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | ADH1A, ADH1C, ADH5 | TSHR 2043/4885ALDH1A1 14/4885KDM4E 698/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.