SCHEMBL472074

SCHEMBL472074

O=C(Oc1ccccc1)C1CC=CCC1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.51
TDP1 Q9NUW8 2/20 0.49
HTT P42858 2/20 0.49
KMT2A Q03164 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
POLB P06746 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.46
MIF P14174 1/20 0.46
RAB9A P51151 2/20 0.43
ALDH1A1 P00352 4/20 0.42
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42
ALOX15 P16050 1/20 0.42
ESR2 Q92731 1/20 0.42
HSD17B10 Q99714 1/20 0.42
GAA P10253 1/20 0.40
CHRNA7 P36544 1/20 0.38
HTR3A P46098 1/20 0.38
USP2 O75604 1/20 0.38
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30877919 0.88 POLB (0.60) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL30877929 0.88 POLB (0.57) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL6882802 0.86 ELANE (0.54) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL30877903 0.83 POLB (0.62) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL30877899 0.82 KMT2A (0.53) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL12370828 0.80 ELANE (0.73) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL3193624 0.80 ELANE (0.73) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL12642500 0.80 ELANE (0.73) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL3079124 0.80 ELANE (0.73) ELANETDP1HTTKMT2ASMN1; SMN2
SCHEMBL525974 0.80 ELANE (0.73) ELANETDP1HTTKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 ELANE 717/4885TDP1 4614/4885HTT 3179/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 ELANE 539/4885TDP1 4169/4885HTT 3707/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.