Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MIF | P14174 | 1/20 | 0.42 |
| ▸ | FABP7 | O15540 | 1/20 | 0.40 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13649880 | 0.98 | MIF (0.43) | MIFFABP7FABP5EPHX1MAPT | |
| SCHEMBL23139546 | 0.90 | MIF (0.39) | MIFFABP7FABP5EPHX1MAPT | |
| SCHEMBL1061665 | 0.87 | MIF (0.43) | MIFMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL7698261 | 0.87 | MIF (0.43) | MIFMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL24687319 | 0.86 | MIF (0.40) | MIFMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL27730899 | 0.80 | MIF (0.46) | MIFMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL1902016 | 0.79 | FABP7 (0.42) | FABP7FABP5EPHX1HTTMEN1 | |
| SCHEMBL11536892 | 0.78 | MIF (0.47) | MIFMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL17061158 | 0.78 | EPHX1 (0.48) | FABP7FABP5EPHX1MAPTHTT | |
| SCHEMBL24595803 | 0.78 | EPHX1 (0.48) | FABP7FABP5EPHX1MAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114423744-A | Method for producing epoxy compound | 株式会社大赛璐 | 2022-04-29 | — | — | CN | disclosed |
| US-8664414-B2 | Process for producing epoxy compound | SHOWA DENKO K.K. (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8466303-B2 | Process for production of epoxy compound | SHOWA DENKO K.K. (JP) | 2013-06-18 | — | — | US | disclosed |
| US-20120029217-A1 | PROCESS FOR PRODUCING EPOXY COMPOUND | SHOWA DENKO K.K. (JP) | 2012-02-02 | — | — | US | disclosed |
| EP-2412712-A1 | METHOD FOR PRODUCING EPOXY COMPOUND | Showa Denko K.K. (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20110009652-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | SHOWA DENKO KK (JP) | 2011-01-13 | — | — | US | disclosed |
| EP-2261219-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | Showa Denko K.K. (JP) | 2010-12-15 | — | — | EP | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120029217-A1 | PROCESS FOR PRODUCING EPOXY COMPOUND | NOX4, NOX5, NOXO1 | MIF 4003/4885FABP7 4726/4885FABP5 4367/4885 |
| US-20110009652-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | DUOX2, EPX, DUOX1 | MIF 3949/4885FABP7 4743/4885FABP5 4741/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.