SCHEMBL472318

SCHEMBL472318

CCCN(CCC)c1ccc(C(=O)O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR3 P49019 3/20 0.57
EGFR P00533 3/20 0.56
ERBB2 P04626 3/20 0.56
SMN1; SMN2 Q16637 2/20 0.54
CA12 O43570 1/20 0.54
CA2 P00918 1/20 0.54
RAB9A P51151 1/20 0.54
CA9 Q16790 1/20 0.54
SLC22A6 Q4U2R8 1/20 0.54
SLC22A8 Q8TCC7 1/20 0.54
ABCC2 Q92887 1/20 0.54
SLC22A12 Q96S37 1/20 0.54
UGT1A7 Q9HAW7 1/20 0.54
SLC22A11 Q9NSA0 1/20 0.54
ALDH1A1 P00352 2/20 0.50
ESRRG P62508 1/20 0.50
TP53 P04637 1/20 0.48
TSHR P16473 1/20 0.48
CNR2 P34972 1/20 0.47
RXRA P19793 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8193682 0.91 EGFR (0.69) HCAR3EGFRERBB2SMN1; SMN2CA12
SCHEMBL472266 0.89 EGFR (0.58) EGFRERBB2SMN1; SMN2CA12CA2
SCHEMBL9313948 0.87 HCAR3 (0.47) HCAR3EGFRERBB2SMN1; SMN2CA12
SCHEMBL11373304 0.87 EGFR (0.56) EGFRERBB2SMN1; SMN2CA12CA2
SCHEMBL472292 0.87 EGFR (0.53) EGFRERBB2ALDH1A1TP53TSHR
SCHEMBL14558227 0.86 SMN1; SMN2 (0.47) HCAR3EGFRERBB2SMN1; SMN2CA12
SCHEMBL10690897 0.86 EGFR (0.57) HCAR3EGFRERBB2SMN1; SMN2CA12
SCHEMBL2498524 0.86 EGFR (0.57) HCAR3EGFRERBB2RAB9AALDH1A1
SCHEMBL1134696 0.85 PTGES (0.54) EGFRERBB2ALDH1A1TP53TSHR
SCHEMBL472312 0.85 PTGES (0.54) EGFRERBB2ALDH1A1TP53TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025086591-A1 ROTIGOTINE PRODRUG DERIVATIVE, PHARMACEUTICAL COMPOSITION THEREOF AND USE THEREOF 烟台药物研究所 2025-05-01 WO disclosed
EP-2492746-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2019-11-20 EP disclosed
EP-2492747-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2018-11-07 EP disclosed
US-10059900-B2 Aminobenzoic acid derivatives THE LUBRIZOL CORPORATION (US) 2018-08-28 US disclosed
EP-2270596-B1 Positive resist compostion and pattern forming process SHINETSU CHEMICAL CO (JP) 2018-07-25 EP disclosed
EP-3062150-B1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2018-06-27 EP disclosed
EP-3081987-B1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2018-06-06 EP disclosed
US-RE46765-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
US-RE46736-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-27 US disclosed
US-20180002629-A1 AMINOBENZOIC ACID DERIVATIVES LUBRIZOL CORP (US) 2018-01-04 US disclosed
EP-2256551-A1 Chemically amplified resist compositon and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2010-12-01 EP disclosed
EP-2253996-A1 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition Shin-Etsu Chemical Co., Ltd. (JP) 2010-11-24 EP disclosed
US-20100291484-A1 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-18 US disclosed
EP-2244124-A2 Patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-10-27 EP disclosed
EP-2244125-A2 Resist composition Shin-Etsu Chemical Co., Ltd. (JP) 2010-10-27 EP disclosed
EP-2244126-A2 Patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-10-27 EP disclosed
US-20100167207-A1 Chemically amplified positive resist composition and resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-01 US disclosed
EP-2202577-A1 Chemically amplified positive resist composition and resist patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-06-30 EP disclosed
EP-2146245-A2 Resist composition and patterning process Shinetsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed
US-20100009299-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-01-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100009299-A1 Resist composition and patterning process ARF4, FGFR2, ARF5 HCAR3 1800/4885EGFR 16/4885ERBB2 107/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.