Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR3 | P49019 | 3/20 | 0.57 |
| ▸ | EGFR | P00533 | 3/20 | 0.56 |
| ▸ | ERBB2 | P04626 | 3/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | CA12 | O43570 | 1/20 | 0.54 |
| ▸ | CA2 | P00918 | 1/20 | 0.54 |
| ▸ | RAB9A | P51151 | 1/20 | 0.54 |
| ▸ | CA9 | Q16790 | 1/20 | 0.54 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.54 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.54 |
| ▸ | ABCC2 | Q92887 | 1/20 | 0.54 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.54 |
| ▸ | UGT1A7 | Q9HAW7 | 1/20 | 0.54 |
| ▸ | SLC22A11 | Q9NSA0 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | ESRRG | P62508 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | CNR2 | P34972 | 1/20 | 0.47 |
| ▸ | RXRA | P19793 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8193682 | 0.91 | EGFR (0.69) | HCAR3EGFRERBB2SMN1; SMN2CA12 | |
| SCHEMBL472266 | 0.89 | EGFR (0.58) | EGFRERBB2SMN1; SMN2CA12CA2 | |
| SCHEMBL9313948 | 0.87 | HCAR3 (0.47) | HCAR3EGFRERBB2SMN1; SMN2CA12 | |
| SCHEMBL11373304 | 0.87 | EGFR (0.56) | EGFRERBB2SMN1; SMN2CA12CA2 | |
| SCHEMBL472292 | 0.87 | EGFR (0.53) | EGFRERBB2ALDH1A1TP53TSHR | |
| SCHEMBL14558227 | 0.86 | SMN1; SMN2 (0.47) | HCAR3EGFRERBB2SMN1; SMN2CA12 | |
| SCHEMBL10690897 | 0.86 | EGFR (0.57) | HCAR3EGFRERBB2SMN1; SMN2CA12 | |
| SCHEMBL2498524 | 0.86 | EGFR (0.57) | HCAR3EGFRERBB2RAB9AALDH1A1 | |
| SCHEMBL1134696 | 0.85 | PTGES (0.54) | EGFRERBB2ALDH1A1TP53TSHR | |
| SCHEMBL472312 | 0.85 | PTGES (0.54) | EGFRERBB2ALDH1A1TP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025086591-A1 | ROTIGOTINE PRODRUG DERIVATIVE, PHARMACEUTICAL COMPOSITION THEREOF AND USE THEREOF | 烟台药物研究所 | 2025-05-01 | — | — | WO | disclosed |
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-10059900-B2 | Aminobenzoic acid derivatives | THE LUBRIZOL CORPORATION (US) | 2018-08-28 | — | — | US | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-3062150-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-06-27 | — | — | EP | disclosed |
| EP-3081987-B1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-06-06 | — | — | EP | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20180002629-A1 | AMINOBENZOIC ACID DERIVATIVES | LUBRIZOL CORP (US) | 2018-01-04 | — | — | US | disclosed |
| EP-2256551-A1 | Chemically amplified resist compositon and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-01 | — | — | EP | disclosed |
| EP-2253996-A1 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-11-24 | — | — | EP | disclosed |
| US-20100291484-A1 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2244124-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2244125-A2 | Resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2244126-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100167207-A1 | Chemically amplified positive resist composition and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-2202577-A1 | Chemically amplified positive resist composition and resist patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| EP-2146245-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009299-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100009299-A1 | Resist composition and patterning process | ARF4, FGFR2, ARF5 | HCAR3 1800/4885EGFR 16/4885ERBB2 107/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.