Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 1/20 | 0.53 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.53 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.52 |
| ▸ | PTGES | O14684 | 2/20 | 0.52 |
| ▸ | RARB | P10826 | 6/20 | 0.51 |
| ▸ | TP53 | P04637 | 1/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | RARA | P10276 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | MTOR | P42345 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | CNR2 | P34972 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL472312 | 0.98 | PTGES (0.54) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL11539577 | 0.98 | PTGES (0.54) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL1134696 | 0.98 | PTGES (0.54) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL3786342 | 0.98 | PTGES (0.54) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL472266 | 0.95 | EGFR (0.58) | EGFRERBB2ALOX5RARBTP53 | |
| SCHEMBL11373304 | 0.93 | EGFR (0.56) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL29138375 | 0.87 | EGFR (0.54) | EGFRERBB2ALOX5PTGESALDH1A1 | |
| SCHEMBL472318 | 0.87 | HCAR3 (0.57) | EGFRERBB2RARBTP53TSHR | |
| SCHEMBL11665982 | 0.86 | ALOX5 (0.45) | EGFRERBB2ALOX5PTGESRARB | |
| SCHEMBL2369922 | 0.86 | EGFR (0.53) | EGFRERBB2ALOX5PTGESCNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360526-B1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-08-16 | — | — | EP | disclosed |
| EP-2256552-B1 | Negative resist composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2017-07-12 | — | — | EP | disclosed |
| US-9604921-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| EP-2244124-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100167207-A1 | Chemically amplified positive resist composition and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-2202577-A1 | Chemically amplified positive resist composition and resist patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| EP-2146245-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009299-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
| WO-2009097953-A1 | UVB FILTER BASED ON ASCORBIC ACID DERIVATIVES | MERCK PATENT GMBH (DE) | 2009-08-13 | — | — | WO | disclosed |
| WO-2009097953-A1 | UVB FILTER BASED ON ASCORBIC ACID DERIVATIVES | MERCK PATENT GMBH (DE) | 2009-08-13 | — | — | WO | disclosed |
| CN-1638770-A | Composition and potentiating method | NEW PHARMA RES SWEDEN AB (SE) | 2005-07-13 | — | — | CN | disclosed |
| WO-2004024151-A1 | COMPOSITION AND POTENTIATING METHOD | NEW PHARMA RESEARCH SWEDEN AB (SE) | 2004-03-25 | — | — | WO | disclosed |
| EP-0461621-B1 | Image forming method | CANON KK (JP) | 1997-10-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100009299-A1 | Resist composition and patterning process | ARF4, FGFR2, ARF5 | EGFR 16/4885ERBB2 107/4885ALOX5 1974/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.