SCHEMBL4729778

SCHEMBL4729778

CC(C)=C(C)c1c(C)cc(C)cc1C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 2/20 0.38
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 3/20 0.37
LMNA P02545 2/20 0.37
GAA P10253 1/20 0.37
MAPT P10636 1/20 0.37
TP53 P04637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TAS1R3 Q7RTX0 2/20 0.34
TAS1R1 Q7RTX1 2/20 0.34
TAS1R2 Q8TE23 2/20 0.34
HPGD P15428 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
SELL P14151 1/20 0.33
SELP P16109 1/20 0.33
SELE P16581 1/20 0.33
CA1 P00915 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL918994 0.88 RAPGEF4 (0.41) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL918995 0.88 RAPGEF4 (0.41) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL2722808 0.77 RAPGEF4 (0.41) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL2848308 0.73 RAPGEF4 (0.43) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL21618541 0.73 KDM4E (0.32) KDM4ETAS1R3TAS1R1TAS1R2
SCHEMBL4334415 0.72 RAPGEF4 (0.38) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL13756307 0.72 RAPGEF4 (0.38) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL698413 0.72 KDM4E (0.46) ALDH1A1KDM4ELMNAMAPTTAS1R3
SCHEMBL29162869 0.72 PRSS1 (0.39) RAPGEF4ALDH1A1KDM4ELMNAGAA
SCHEMBL1109757 0.72 RAPGEF4 (0.38) RAPGEF4ALDH1A1KDM4ELMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017082745-A1 ANTIMICROBIAL ADDITIVE GWD GLOBAL, INC. (US) 2017-05-18 WO disclosed
US-20080058482-A1 reaction mixture comprises an anionically polymerizable monomer, and an initiator; monomer is polymerized to form a polymer having unmodified polymer chain ends 3M INNOVATIVE PROPERTIES COMPANY 2008-03-06 US disclosed
WO-2008027764-A1 CONTINUOUS PROCESS POLYMERIZATION OF (METH)ACRYLATE COPOLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2008-03-06 WO disclosed
US-20070100006-A1 FLUORINATED POLYMERS 3M INNOVATIVE PROPERTIES COMPANY 2007-05-03 US disclosed
EP-1263794-B1 CONTINUOUS PROCESS FOR THE PRODUCTION OF CONTROLLED ARCHITECTURE MATERIALS 3M INNOVATIVE PROPERTIES CO (US) 2006-03-08 EP disclosed
US-20050154071-A1 Fluorinated polymers 3M INNOVATIVE PROPERTIES COMPANY 2005-07-14 US disclosed
US-20050154142-A1 Fluorinated polymers and related methods 3M INNOVATIVE PROPERTIES COMPANY 2005-07-14 US disclosed
US-6903173-B2 Fluorinated polymers 3M INNOVATIVE PROPERTIES CO. (US) 2005-06-07 US disclosed
EP-1527135-A1 FLUORINATED POLYMERS 3M Innovative Properties Company (US) 2005-05-04 EP disclosed
WO-2004013225-A1 FLUORINATED POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-02-12 WO disclosed
US-20040023016-A1 Fluorinated polymers 3M INNOVATIVE PROPERTIES COMPANY 2004-02-05 US disclosed
EP-1263794-A1 CONTINUOUS PROCESS FOR THE PRODUCTION OF CONTROLLED ARCHITECTURE MATERIALS 3M Innovative Properties Company (US) 2002-12-11 EP disclosed
US-6448353-B1 ANIONIC SOLUTION POLYMERIZATION OF TEMPERATURE SENSITIVE MONOMERS UNDER PLUG FLOW AND TEMPERATURE CONTROLLED CONDITIONS; MINIMIZING SIDE REACTIONS; NARROW POLYDISPERSITY; TAILORING FOR SPECIFIC APPLICATIONS 3M INNOVATIVE PROPERTIES COMPANY 2002-09-10 US disclosed
WO-2001058962-A1 CONTINUOUS PROCESS FOR THE PRODUCTION OF CONTROLLED ARCHITECTURE MATERIALS 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-08-16 WO disclosed