SCHEMBL475030

SCHEMBL475030

CC(=CC12CC3CC(CC(C3)C1)C2)C(N)=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPFFR1 Q9GZQ6 1/20 0.40
NPFFR2 Q9Y5X5 1/20 0.40
THRB P10828 1/20 0.38
CYP2C9 P11712 1/20 0.38
ALDH1A1 P00352 6/20 0.38
EPHX1 P07099 3/20 0.38
NPC1 O15118 1/20 0.38
TSHR P16473 2/20 0.37
CRHBP P24387 1/20 0.34
HTT P42858 1/20 0.34
CRHR2 Q13324 1/20 0.34
MCOLN3 Q8TDD5 1/20 0.34
EPHX2 P34913 2/20 0.33
ALOX12 P18054 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CCR6 P51684 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
LMNA P02545 2/20 0.31
SLC22A2 O15244 1/20 0.31
SLC22A1 O15245 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4084702 1.00 NPFFR1 (0.40) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL1338899 0.91 NPFFR1 (0.33) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL757168 0.82 THRB (0.39) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL157720 0.82 THRB (0.39) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL4086304 0.81
SCHEMBL562688 0.80 THRB (0.38) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL7125894 0.77 GLA (0.40) ALDH1A1EPHX1TSHREPHX2
SCHEMBL702221 0.77 GLA (0.40) ALDH1A1EPHX1TSHREPHX2
SCHEMBL2250804 0.77 ALDH1A1 (0.33) NPFFR1NPFFR2THRBCYP2C9ALDH1A1
SCHEMBL15348321 0.74 NAAA (0.36) THRBCYP2C9ALDH1A1EPHX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4314164-A1 RUBBERIZED ASPHALT COMPOSITION WITH ACRYLIC COPOLYMER BASF SE (DE) 2024-02-07 EP claimed
CN-111533941-A Method for realizing macroscopic supermolecule assembly of rigid material by using hydrogel coating 北京化工大学 2020-08-14 CN disclosed
US-8795858-B2 Magnetic recording medium and method of manufacturing the same FUJIFILM CORPORATION (JP) 2014-08-05 US disclosed
US-8632896-B2 Radiation-curable vinyl chloride copolymer, radiation-curable composition, and magnetic recording medium FUJIFILM CORPORATION (JP) 2014-01-21 US disclosed
US-8617728-B2 Magnetic tape and method of manufacturing the same FUJIFILM CORPORATION (JP) 2013-12-31 US disclosed
US-8603652-B2 Magnetic recording medium FUJIFILM CORPORATION (JP) 2013-12-10 US disclosed
EP-2411466-B1 COMPOSITION COMPRISING AS THE AQUEOUS DISPERSION PREFERABLY (METH)ACRYLATE POLYMERS CONTAINING BENZOPHENONE IN A MIXTURE WITH (METH)ACRYLATE POLYMERS DIFFERENT THEREFROM AND THE USE OF SAID COMPOSITION EVONIK ROEHM GMBH (DE) 2013-07-17 EP disclosed
EP-2411466-A1 COMPOSITION COMPRISING AS THE AQUEOUS DISPERSION PREFERABLY (METH)ACRYLATE POLYMERS CONTAINING BENZOPHENONE IN A MIXTURE WITH (METH)ACRYLATE POLYMERS DIFFERENT THEREFROM AND THE USE OF SAID COMPOSITION Evonik Röhm GmbH (DE) 2012-02-01 EP disclosed
US-20110274947-A1 MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2011-11-10 US disclosed
US-20110229740-A1 MAGNETIC TAPE AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed
EP-1905787-B1 Lithographic printing plate precursor using a polymer latex of high acrylonitrile content FUJIFILM CORP (JP) 2011-05-18 EP disclosed
US-20110111258-A1 RADIATION-CURABLE VINYL CHLORIDE COPOLYMER, RADIATION-CURABLE COMPOSITION, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2011-05-12 US disclosed
WO-2010108762-A1 COMPOSITION COMPRISING AS THE AQUEOUS DISPERSION PREFERABLY (METH)ACRYLATE POLYMERS CONTAINING BENZOPHENONE IN A MIXTURE WITH (METH)ACRYLATE POLYMERS DIFFERENT THEREFROM AND THE USE OF SAID COMPOSITION EVONIK RÖHM GMBH (DE) 2010-09-30 WO disclosed
US-20090197205-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-7500895-B2 Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORPORATION (JP) 2009-03-10 US disclosed
US-20080096132-A1 mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and an alkali metal persulfate polymerization initiator to conduct emulsion polymerization; distilling off unpolymerized monomers; chemical resistance film, gas barrier FUJIFILM CORPORATION 2008-04-24 US disclosed
EP-1905787-A2 Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
US-20060127563-A1 Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORPORATION (JP) 2006-06-15 US disclosed
US-20050287392-A1 Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2005-12-29 US disclosed
EP-0750899-A2 An emulsifier or solubilizer which consists of a water soluble amphiphilic polyelectrolyte, and an emulsified composition or a solubilized composition and an emulsified cosmetic or a solubilized cosmetic containing it SHISEIDO COMPANY LIMITED (JP) 1997-01-02 EP disclosed