Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | WRN | Q14191 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 3/20 | 0.32 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20008841 | 0.85 | NAAA (0.53) | NAAAALDH1A1CYP1A2HPGDCYP2C19 | |
| SCHEMBL47575 | 0.82 | ALDH1A1 (0.39) | ALDH1A1KMT2AGAA | |
| SCHEMBL47545 | 0.81 | GAA (0.52) | ALDH1A1CYP1A2KMT2AGAAMGAM | |
| SCHEMBL19007797 | 0.81 | GAA (0.60) | ALDH1A1CYP1A2KMT2AGAAMGAM | |
| SCHEMBL15383923 | 0.80 | KMT2A (0.37) | ALDH1A1KMT2AGAAMGAMSI | |
| SCHEMBL681192 | 0.80 | NAAA (0.52) | NAAAALDH1A1CYP1A2HPGDCYP2C19 | |
| SCHEMBL11604881 | 0.79 | GAA (0.50) | ALDH1A1CYP1A2KMT2AGAAMGAM | |
| SCHEMBL10173581 | 0.79 | KMT2A (0.32) | KMT2A | |
| SCHEMBL7009464 | 0.79 | GAA (0.50) | ALDH1A1CYP1A2KMT2AGAAMGAM | |
| SCHEMBL15445595 | 0.78 | CA12 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 241 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170285469-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9740105-B2 | Resist pattern formation method and resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20170176855-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9639002-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9618843-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618842-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-9606433-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9529266-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20100143845-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100136478-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. | 2010-06-03 | — | — | US | disclosed |
| US-20100119974-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. | 2010-05-13 | — | — | US | disclosed |
| US-20100086873-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100047724-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100015552-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20090274976-A1 | Negative resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090226842-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090162788-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | ASIC1, RER1, GRIN1 | NAAA 94/4885ALDH1A1 717/4885CYP1A2 1460/4885 |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | SLC11A2, DRD1, ZYX | NAAA 2176/4885ALDH1A1 367/4885CYP1A2 699/4885 |
| US-20100136478-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | ASIC1, RER1, ABCC1 | NAAA 338/4885ALDH1A1 539/4885CYP1A2 1022/4885 |
| US-20170176855-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | RB1, FXR1, GAR1 | NAAA 4404/4885ALDH1A1 900/4885CYP1A2 2082/4885 |
| US-20100119974-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | C1R, SCO2, RER1 | NAAA 940/4885ALDH1A1 2259/4885CYP1A2 2468/4885 |
| US-20090162788-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | RER1, ASIC1, GLRA1 | NAAA 425/4885ALDH1A1 987/4885CYP1A2 305/4885 |
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | SLC11A2, DRD1, ZYX | NAAA 2149/4885ALDH1A1 376/4885CYP1A2 736/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.