SCHEMBL4768441

SCHEMBL4768441

CCC(C)[SiH](OC)C(C)CC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7770677 0.78 TSHR (0.32) TSHR
SCHEMBL4766512 0.77 TSHR (0.32) TSHR
SCHEMBL122897 0.75
SCHEMBL1313494 0.73 LMNA (0.32)
SCHEMBL22534508 0.73
SCHEMBL23092249 0.73
Propane SCHEMBL8411429 0.73 TSHR (0.30) TSHR
Ethane SCHEMBL5833961 0.73 TSHR (0.30) TSHR
SCHEMBL28310426 0.73
Isobutane SCHEMBL27493829 0.73 TSHR (0.30) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US disclosed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN disclosed
WO-2020209202-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM 東ソー株式会社 2020-10-15 WO disclosed
CN-102558213-B Silanol-containing triarylamine derivatives SHINETSU CHEMICAL CO 2015-04-15 CN disclosed
EP-2457917-B1 Silanol-containing triarylamine derivatives SHINETSU CHEMICAL CO (JP) 2014-06-18 EP disclosed
US-8575384-B2 Silanol-containing triarylamine derivatives SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20120149913-A1 SILANOL-CONTAINING TRIARYLAMINE DERIVATIVES SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-14 US disclosed
EP-2457917-A1 Silanol-containing triarylamine derivatives Shin-Etsu Chemical Co., Ltd. (JP) 2012-05-30 EP disclosed
EP-1832351-B1 Low dielectric materials and methods for making same AIR PROD & CHEM (US) 2008-11-12 EP disclosed
EP-1837086-A2 Low dielectric materials and methods for making same Air Products and Chemicals, Inc. (US) 2007-09-26 EP disclosed
EP-1832351-A2 Low dielectric materials and methods for making same Air Products and Chemicals, Inc. (US) 2007-09-12 EP disclosed
US-20050260420-A1 Low dielectric materials and methods for making same VERSUM MATERIALS US, LLC 2005-11-24 US disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM VSIR, SMURF2, SMURF1 TSHR 791/4885
US-20120149913-A1 SILANOL-CONTAINING TRIARYLAMINE DERIVATIVES SIK2, AS3MT, ILK TSHR 2248/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.