SCHEMBL4806162

SCHEMBL4806162

C=C(Cc1ccc(-c2cccc(C)c2)cc1)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PPARG P37231 1/20 0.50
▸ PPARA Q07869 1/20 0.50
▸ MME P08473 1/20 0.46
▸ HCAR2 Q8TDS4 1/20 0.46
▸ ABCC4 O15439 1/20 0.46
▸ LMNA P02545 1/20 0.46
▸ GAA P10253 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ PTGS1 P23219 1/20 0.46
▸ HTT P42858 1/20 0.46
▸ WNT3A P56704 1/20 0.46
▸ MEN1 O00255 2/20 0.45
▸ KMT2A Q03164 2/20 0.45
▸ RAB9A P51151 1/20 0.45
▸ CCNA2 P20248 1/20 0.45
▸ CDK2 P24941 1/20 0.45
▸ CCNA1 P78396 1/20 0.45
▸ HSD17B1 P14061 2/20 0.43
▸ HSD17B2 P37059 2/20 0.43
▸ CTBP2 P56545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12087753 0.84 ABCC4 (0.67) PPARGPPARAMMEHCAR2ABCC4
SCHEMBL4806417 0.84 CTBP2 (0.51) PPARGPPARAABCC4LMNAGAA
SCHEMBL36672 0.84 LMNA (0.64) ABCC4LMNAGAATSHRPTGS1
SCHEMBL7440906 0.82 CTBP2 (0.61) CTBP2
Hydrochloric Acid SCHEMBL8692226 0.82 LMNA (0.62) ABCC4LMNAGAATSHRPTGS1
SCHEMBL2732935 0.82 LMNA (0.54) ABCC4LMNAGAATSHRPTGS1
SCHEMBL9860301 0.81 WNT3A (0.49) PPARGPPARAMMEHCAR2ABCC4
SCHEMBL5487173 0.79 FAAH (0.48) ABCC4LMNAGAATSHRPTGS1
SCHEMBL1921797 0.78 CTBP2 (0.56) LMNAGAAMEN1KMT2ARAB9A
SCHEMBL4805354 0.76 HSD17B2 (0.54) PPARGPPARAHSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 — — US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 — — EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 — — US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 — — WO disclosed
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