Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | PRKCA | P17252 | 1/20 | 0.45 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | SCN1A | P35498 | 1/20 | 0.39 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.39 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12132675 | 0.86 | ALDH1A1 (0.58) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL482690 | 0.84 | ALDH1A1 (0.50) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL6114854 | 0.83 | ALDH1A1 (0.46) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL7110123 | 0.83 | NPSR1 (0.50) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL7475995 | 0.79 | NPSR1 (0.53) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL481971 | 0.78 | ALDH1A1 (0.50) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL12972101 | 0.77 | PRKCA (0.56) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL482692 | 0.77 | ALDH1A1 (0.49) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL17550595 | 0.77 | ALDH1A1 (0.49) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL6452242 | 0.76 | EPHX2 (0.52) | ALDH1A1NPSR1MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | claimed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | disclosed |
| EP-2244124-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-26 | — | — | EP | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20020187421-A1 | Method of producing photoresist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-12-12 | — | — | US | disclosed |
| US-20020164540-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020155376-A1 | Mixture of radiation sensive compound and binder; fluoropolymers | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-20020081524-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-27 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-20020012874-A1 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0856773-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |