Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | PRKCA | P17252 | 1/20 | 0.45 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | SCN1A | P35498 | 1/20 | 0.42 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.42 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25634720 | 0.87 | ALDH1A1 (0.48) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL6357099 | 0.87 | ALDH1A1 (0.47) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL2618623 | 0.86 | ALDH1A1 (0.46) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL12132675 | 0.86 | ALDH1A1 (0.58) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL17550539 | 0.85 | CYP17A1 (0.42) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL10211807 | 0.83 | ALDH1A1 (0.46) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL12972074 | 0.83 | ALDH1A1 (0.44) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL17550547 | 0.83 | CYP17A1 (0.40) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL18469289 | 0.82 | ALDH1A1 (0.43) | ALDH1A1NPSR1MEN1KMT2AMAPT | |
| SCHEMBL17550600 | 0.81 | CYP17A1 (0.39) | ALDH1A1NPSR1MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9809669-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-07 | — | — | US | disclosed |
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9645490-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160334702-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-17 | — | — | US | disclosed |
| US-20160170298-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160145205-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | ALDH1A1 2530/4885NPSR1 1428/4885MEN1 3032/4885 |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RXRA, C1R | ALDH1A1 428/4885NPSR1 1649/4885MEN1 4136/4885 |
| US-20160334702-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FRG1, C1R | ALDH1A1 2924/4885NPSR1 220/4885MEN1 3173/4885 |
| US-20160145205-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, FFAR3 | ALDH1A1 3718/4885NPSR1 416/4885MEN1 3316/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | ALDH1A1 1178/4885NPSR1 1176/4885MEN1 4160/4885 |
| US-20160170298-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | FGFR1, PKD1, KCNA1 | ALDH1A1 537/4885NPSR1 1172/4885MEN1 1163/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.