SCHEMBL4827161

SCHEMBL4827161

Cc1ccc(S(=O)(=O)ON2C(=O)C3C(C2=O)C2C(=O)N(OS(=O)(=O)c4ccc(C)cc4)C(=O)C32)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 2/20 0.63
ALDH1A1 P00352 6/20 0.54
KDM4E B2RXH2 5/20 0.54
HPGD P15428 2/20 0.54
LMNA P02545 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
KMT2A Q03164 5/20 0.46
MEN1 O00255 2/20 0.46
MAPT P10636 4/20 0.46
F2 P00734 3/20 0.45
PARL Q9H300 2/20 0.43
GAA P10253 2/20 0.42
CYP2D6 P10635 2/20 0.41
XBP1 P17861 1/20 0.41
HTT P42858 1/20 0.41
CYP1A2 P05177 1/20 0.41
MMP2 P08253 2/20 0.41
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4835774 0.90 VDR (0.56) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL12198606 0.86 VDR (0.52) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL382669 0.86 VDR (0.52) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL2070882 0.86 VDR (0.52) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL14500656 0.86 VDR (0.52) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL4354758 0.85 VDR (0.51) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL4837258 0.85 VDR (0.58) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL4829793 0.84 KMT2A (0.60) VDRALDH1A1KDM4EHPGDLMNA
SCHEMBL4835021 0.83 GAA (0.49) VDRLMNASMN1; SMN2KMT2AMEN1
SCHEMBL4330229 0.83 VDR (0.49) VDRALDH1A1KDM4EHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 VDR 4831/4885ALDH1A1 633/4885KDM4E 2501/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.