Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | CASP6 | P55212 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL482616 | 0.86 | CNR1 (0.36) | KMT2AMEN1ALDH1A1MAPTLMNA | |
| SCHEMBL482975 | 0.81 | TP53 (0.34) | KMT2AMEN1ALDH1A1L3MBTL1MAPT | |
| SCHEMBL483000 | 0.81 | ALDH1A1 (0.36) | KMT2AMEN1ALDH1A1L3MBTL1MAPT | |
| SCHEMBL483287 | 0.80 | L3MBTL1 (0.35) | KMT2AMEN1ALDH1A1L3MBTL1MAPT | |
| SCHEMBL6930801 | 0.79 | CYP3A4 (0.44) | KMT2AMEN1ALDH1A1L3MBTL1MAPT | |
| SCHEMBL5691541 | 0.79 | TP53 (0.33) | ALDH1A1L3MBTL1MAPTNPC1RAB9A | |
| SCHEMBL269338 | 0.79 | HDAC3 (0.38) | KMT2AMEN1ALDH1A1L3MBTL1MAPT | |
| SCHEMBL483355 | 0.78 | ALDH1A1 (0.39) | ALDH1A1MAPTLMNAPOLBNPC1 | |
| SCHEMBL267592 | 0.77 | PTPN1 (0.36) | KMT2AMEN1L3MBTL1LMNANPC1 | |
| SCHEMBL268803 | 0.77 | HPGD (0.44) | KMT2AMEN1ALDH1A1MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210197447-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2021-07-01 | — | — | US | disclosed |
| EP-3492982-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| EP-3492982-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-3295246-B1 | METHOD FOR MAKING AN OBJECT | PHOTOCENTRIC LTD (GB) | 2019-05-01 | — | — | EP | disclosed |
| US-20180141268-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2018-05-24 | — | — | US | disclosed |
| EP-3295246-A1 | METHOD FOR MAKING AN OBJECT | Photocentric Limited (GB) | 2018-03-21 | — | — | EP | disclosed |
| EP-0949540-B1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJIFILM CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-8114569-B2 | Maskless photopolymer exposure process and apparatus | PHOTOCENTRIC LIMITED (GB) | 2012-02-14 | — | — | US | disclosed |
| EP-1288720-B1 | Plate-making method of printing plate | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20090190107-A1 | MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS | PHOTOCENTRIC LIMITED (GB) | 2009-07-30 | — | — | US | disclosed |
| EP-1471387-A2 | Photosensitive composition and compound used thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-20040191679-A1 | Photosensitive composition and novel compound used therefor | FUJI PHOTO FILM CO., LTD. | 2004-09-30 | — | — | US | disclosed |
| US-6727044-B1 | LASER SCANNING LITHOGRAPHIC PRINTING ORIGINAL PLATE WHICH CAN PROVIDE A PRINTING PLATE HAVING A SUFFICIENTLY LONG PRESS LIFE EVEN BY HIGH-SPEED SCAN EXPOSURE AND CAUSES LITTLE FLUCTUATION IN THE PRINTING PERFORMANCE OF THE PRINTING PLATE | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20030190554-A1 | Photopolymerization; development using alkalinity developer | FUJIFILM CORPORATION (JP) | 2003-10-09 | — | — | US | disclosed |
| EP-1341040-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-1288720-A1 | Plate-making method of printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-6153660-A | VERY HIGH SENSITIVITY TO BEAMS IN THE VISIBLE REGION, PARTICULARLY TO VISIBLE RAYS AT 400 NM OR MORE SUCH AS RAYS AT 488 NM OR 532 NM CORRESPONDING TO THE OUTPUT OF AR+ LASER OR YAG-SHG LASER | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-0949540-A1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJI PHOTO FILM CO., LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0924570-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-06-23 | — | — | EP | disclosed |
| US-5026625-A | Photoinitiators for polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |