SCHEMBL48305

SCHEMBL48305

Oc1cc(Cl)c(O)cc1Cl

nearest known ligand 0.86

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 11/20 0.86
TSHR P16473 8/20 0.86
HPGD P15428 7/20 0.86
CYP3A4 P08684 5/20 0.61
ALDH1A1 P00352 5/20 0.61
TDP1 Q9NUW8 1/20 0.61
HSP90AA1 P07900 1/20 0.56
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
TTR P02766 1/20 0.44
CASP1 P29466 1/20 0.44
RECQL P46063 1/20 0.44
ADRA1A P35348 1/20 0.43
ESR2 Q92731 1/20 0.42
MAPK1 P28482 3/20 0.41
ALOX15 P16050 2/20 0.41
ALOX12 P18054 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triclofenol SCHEMBL1338 0.93 HSD17B10 (1.00) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL592892 0.93 HSD17B10 (0.75) HSD17B10TSHRHPGDCYP3A4ALDH1A1
Triclofenol SCHEMBL29387498 0.93 HSD17B10 (1.00) HSD17B10TSHRHPGDCYP3A4ALDH1A1
Triclofenol SCHEMBL2813598 0.89 HSD17B10 (0.93) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL69259 0.88 HSD17B10 (0.80) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL10357236 0.87 HSD17B10 (0.67) HSD17B10TSHRHPGDCYP3A4ALDH1A1
Methoxymethane SCHEMBL11335592 0.87 HSD17B10 (0.67) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL9782602 0.84 CYP3A4 (0.65) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL29402084 0.83 HSD17B10 (0.73) HSD17B10TSHRHPGDCYP3A4ALDH1A1
SCHEMBL70334 0.83 HSD17B10 (0.73) HSD17B10TSHRHPGDCYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1787 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250174824-A1 MODIFIED POLYPHENYLENE SULFIDE (PPS) AND PPS MODIFICATION METHOD, PPS SOLID SEPARATOR, PREFABRICATED ZINC SALT SEPARATOR AND MANUFACTURING METHOD THEREOF, TO-BE-FILLED ZINC-MANGANESE SECONDARY BATTERY, AND MANUFACTURING AND APPLICATION METHODS THEREOF JIANGSU UNIVERSITY (CN) 2025-05-29 US claimed
WO-2024212909-A1 MODIFIED POLYPHENYLENE SULFIDE AND MODIFICATION METHOD THEREFOR, POLYPHENYLENE SULFIDE SOLID SEPARATOR, PRE-PREPARED ZINC SALT SEPARATOR AND MANUFACTURING METHOD THEREFOR, INJECTION-READY ZINC-MANGANESE SECONDARY BATTERY AND MANUFACTURING AND APPLICATION METHODS THEREFOR 江苏大学 2024-10-17 WO claimed
CN-118185010-A Modified polyphenylene sulfide, solid-state diaphragm, ampere-hour zinc-manganese secondary battery and manufacturing and forming methods thereof 江苏大学 2024-06-14 CN claimed
CN-116988102-B Nano transport alkaline electrolyzed water diaphragm and manufacturing method thereof 江苏大学 2024-04-09 CN claimed
CN-117647082-A Drying device and method for 2, 5-dichloro hydroquinone 扬州工业职业技术学院 2024-03-05 CN claimed
CN-117264212-A Modified polyphenylene sulfide, solid-state diaphragm, ampere-hour zinc-manganese secondary battery and manufacturing and forming methods thereof 江苏大学 2023-12-22 CN claimed
CN-116988102-A Nano transport alkaline electrolyzed water diaphragm and manufacturing method thereof 江苏大学 2023-11-03 CN claimed
US-11673997-B2 Work time to walk-on time ratio by adding a phenolic catalyst to polyaspartic flooring formulations COVESTRO LLC (US) 2023-06-13 US claimed
EP-4004076-A1 IMPROVED WORK TIME TO WALK-ON TIME RATIO BY ADDING A PHENOLIC CATALYST TO POLYASPARTIC FLOORING FORMULATIONS Covestro LLC (US) 2022-06-01 EP claimed
CN-114144454-A Improved operating time to open-run time ratio by adding phenolic catalysts to polyaspartic flooring formulations 科思创有限公司 2022-03-04 CN claimed
EP-0278377-B1 PROCESS FOR THE MANUFACTURE OF HIGHLY PURE TETRACHLORO-1,4-BENZOQUINONE HOECHST AKTIENGESELLSCHAFT (DE) 1992-04-08 EP claimed
EP-0278378-B1 PROCESS FOR THE MANUFACTURE OF HIGHLY PURE TETRACHLORO-1,4-BENZOQUINONE HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-08 EP claimed
US-4873173-A HAVING A HYDRAZINE-COMPOUND IN THE SEMULSION LAYER; HIGH CONTRAST AND RESOLUTION; AUTOMATIC DEVELOPING APPARATUS FUJI PHOTO FILM CO., LTD. (JP) 1989-10-10 US claimed
US-4863830-A Process for hard tone development of silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1989-09-05 US claimed
EP-0278377-A2 Process for the manufacture of highly pure tetrachloro-1,4-benzoquinone HOECHST AKTIENGESELLSCHAFT (DE) 1988-08-17 EP claimed
EP-0278378-A2 Process for the manufacture of highly pure tetrachloro-1,4-benzoquinone HOECHST AKTIENGESELLSCHAFT (DE) 1988-08-17 EP claimed
US-4518808-A REACTING HYDROQUINONE AND SULFURYL CHLORIDE EASTMAN KODAK COMPANY (US) 1985-05-21 US claimed
US-4487975-A Etherification of phenols RHONE-POULENC INDUSTRIES (FR) 1984-12-11 US claimed
US-4425404-A MULTILAYER, PROTECTIVE COATINGS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1984-01-10 US claimed
US-3970459-A Process for developing a direct reversal silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JA) 1976-07-20 US claimed