SCHEMBL4837204

SCHEMBL4837204

O=C1CC2=C(C(=O)N(OS(=O)(=O)c3ccc([N+](=O)[O-])cc3)C2=O)C2=C[N+](=O)C(OS(=O)(=O)c3ccc([N+](=O)[O-])cc3)C12

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ ACHE P22303 1/20 0.30
▸ PARL Q9H300 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4837395 0.83 KMT2A (0.34) —
SCHEMBL4837187 0.65 MMP2 (0.33) ACHEPARL
SCHEMBL2957966 0.65 PARL (0.62) ACHEPARL
SCHEMBL11022400 0.64 KDM4E (0.69) PARL
SCHEMBL6650340 0.64 CA1 (0.44) ACHEPARL
SCHEMBL4829940 0.63 PARL (0.44) ACHEPARL
SCHEMBL4899510 0.62 MMP2 (0.32) —
SCHEMBL19469376 0.59 CA1 (0.48) ACHEPARL
SCHEMBL3830558 0.59 POLB (0.54) —
SCHEMBL3824481 0.57 KMT2A (0.46) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed
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