SCHEMBL4837395

SCHEMBL4837395

O=C1CC2=C(C(=O)N(OS(=O)(=O)c3ccc4ccccc4c3)C2=O)C2=C[N+](=O)C(OS(=O)(=O)c3ccc4ccccc4c3)C12

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.34
▸ KDM4E B2RXH2 7/20 0.33
▸ ALDH1A1 P00352 7/20 0.33
▸ MAPT P10636 5/20 0.33
▸ MEN1 O00255 3/20 0.33
▸ HPGD P15428 5/20 0.32
▸ HTT P42858 1/20 0.32
▸ VDR P11473 2/20 0.31
▸ F2 P00734 1/20 0.31
▸ LMNA P02545 1/20 0.30
▸ THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4837204 0.83 ACHE (0.30) —
SCHEMBL4836653 0.82 MEN1 (0.31) KMT2AMEN1
SCHEMBL4835252 0.77 — —
SCHEMBL11153289 0.67 KDM4E (0.66) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL65691 0.65 PARL (0.65) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL24943438 0.63 KDM4E (0.74) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL4833868 0.62 KMT2A (0.33) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL3831003 0.61 KDM4E (0.52) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL19469363 0.60 LMNA (0.50) KMT2AKDM4EALDH1A1MAPTMEN1
SCHEMBL22384036 0.60 PARL (0.55) KMT2AKDM4EALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 KMT2A 1016/4885KDM4E 2501/4885ALDH1A1 633/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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