SCHEMBL4850872

SCHEMBL4850872

O=C(O)C(C(=O)O)(C1CO1)C1CCCCC1C(C(=O)O)(C(=O)O)C1CO1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
KEAP1 Q14145 1/20 0.32
NFE2L2 Q16236 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5050657 0.78
SCHEMBL8107590 0.70 ALDH1A1 (0.33)
SCHEMBL466328 0.69 LMNA (0.31)
SCHEMBL933740 0.69 LMNA (0.31)
SCHEMBL8328164 0.64 KEAP1 (0.42) CYP3A4KEAP1NFE2L2
SCHEMBL21269582 0.62 KEAP1 (0.41) CYP3A4KEAP1NFE2L2
SCHEMBL21269265 0.62 KEAP1 (0.41) CYP3A4KEAP1NFE2L2
SCHEMBL21269428 0.62 KEAP1 (0.41) CYP3A4KEAP1NFE2L2
SCHEMBL28315803 0.62 KEAP1 (0.41) CYP3A4KEAP1NFE2L2
SCHEMBL28315810 0.62 KEAP1 (0.41) CYP3A4KEAP1NFE2L2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112961570-B Environment-friendly underwater toughened epoxy resin adhesive and preparation method thereof 杭州每步材料科技有限公司 2024-07-12 CN claimed
CN-115831439-A Low-temperature conductive silver paste suitable for fine grid overprinting and used for photovoltaic HJT battery and preparation method thereof 江苏太阳科技股份有限公司 2023-03-21 CN claimed
CN-111909491-B Photo-sensitive composite resin for photo-curing 3D printing and preparation method thereof 广东工业大学 2023-02-07 CN claimed
US-7338747-B2 Photoresist composition and method pattern forming using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2008-03-04 US claimed
US-7026091-B2 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-04-11 US claimed
US-20050019691-A1 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2005-01-27 US claimed
US-20040142272-A1 Photoresist composition and method pattern forming using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2004-07-22 US claimed
CN-112961570-B Environment-friendly underwater toughened epoxy resin adhesive and preparation method thereof 杭州每步材料科技有限公司 2024-07-12 CN disclosed
CN-115197406-B Polyester resin, powder coating and preparation method thereof 成都信达高分子材料有限公司 2024-03-26 CN disclosed
CN-116731652-A Single-component yellowing-resistant ultraviolet light delay curing type Mini LED epoxy packaging adhesive and preparation method thereof 信泰永合(烟台)新材料有限公司 2023-09-12 CN disclosed
CN-114031306-B Colorful solar glass panel and manufacturing method thereof 杭州玻美文化艺术有限公司 2023-03-28 CN disclosed
CN-115831439-A Low-temperature conductive silver paste suitable for fine grid overprinting and used for photovoltaic HJT battery and preparation method thereof 江苏太阳科技股份有限公司 2023-03-21 CN disclosed
CN-115197406-A Polyester resin, powder coating and preparation method thereof 成都信达高分子材料有限公司 2022-10-18 CN disclosed
US-7338747-B2 Photoresist composition and method pattern forming using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2008-03-04 US disclosed
EP-0922714-B1 ELECTROPHOTOGRAPHIC TONER TOMOEGAWA PAPER CO LTD (JP) 2006-09-20 EP disclosed
US-7026091-B2 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-04-11 US disclosed
US-20050019691-A1 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2005-01-27 US disclosed
US-20040142272-A1 Photoresist composition and method pattern forming using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2004-07-22 US disclosed
US-6194113-B1 TONER COMPRISING AN ALPHA-OLEFIN COPOLYMER WITH MALEIC ANHYDRIDE AND/OR MALEATE ESTER UNITS, CROSSLINKED WITH A DI-OR POLYOL, SUCH AS ALIPHATIC LONG CHAIN DIOL, POLYOXYALKYLENE GLYCOL, OR BISPHENOL A EPOXY RESIN; LOW MELTING, SHELF LIFE TOMOEGAWA PAPER CO., LTD. (JP) 2001-02-27 US disclosed
EP-0922714-A1 OLEFINIC RESIN AND ELECTROPHOTOGRAPHIC TONER PREPARED THEREFROM TOMOEGAWA PAPER CO. LTD. (JP) 1999-06-16 EP disclosed