Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4866299 | 0.96 | TET2 (0.31) | TET2 | |
| Maleic Acid SCHEMBL2013642 | 0.83 | GPR84 (0.43) | GPR84FFAR1FFAR4TET2 | |
| Maleic Acid SCHEMBL2013518 | 0.78 | CAMK2A (0.42) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL7053346 | 0.78 | TSHR (0.43) | — | |
| Ethylene SCHEMBL27926907 | 0.76 | GPR84 (0.50) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL16665 | 0.74 | GPR84 (0.52) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL743707 | 0.72 | GPR84 (0.56) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL17240331 | 0.72 | GPR84 (0.56) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL890450 | 0.72 | GPR84 (0.56) | GPR84FFAR1FFAR4TET2 | |
| SCHEMBL139573 | 0.72 | GPR84 (0.56) | GPR84FFAR1FFAR4TET2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7419760-B2 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2008-09-02 | — | — | US | claimed |
| US-7288364-B2 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-30 | — | — | US | claimed |
| US-20060063104-A1 | Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-03-23 | — | — | US | claimed |
| US-20060046184-A1 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-03-02 | — | — | US | claimed |
| US-7419760-B2 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2008-09-02 | — | — | US | disclosed |
| US-7288364-B2 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-30 | — | — | US | disclosed |
| US-20060063104-A1 | Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-03-23 | — | — | US | disclosed |
| US-20060046184-A1 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-03-02 | — | — | US | disclosed |