Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 7/20 | 0.42 |
| ▸ | PPARG | P37231 | 6/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | PPARD | Q03181 | 3/20 | 0.35 |
| ▸ | FABP2 | P12104 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | ACACB | O00763 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
| ▸ | TBXAS1 | P24557 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10338732 | 0.89 | PPARA (0.42) | PPARAPPARGALDH1A1PPARDFABP2 | |
| SCHEMBL15945052 | 0.81 | PPARA (0.41) | PPARAPPARGALDH1A1PPARDFABP2 | |
| SCHEMBL3195033 | 0.80 | LMNA (0.38) | TAAR1 | |
| SCHEMBL16035907 | 0.79 | PPARA (0.42) | PPARAPPARDSMN1; SMN2KDM4ETAAR1 | |
| SCHEMBL7110250 | 0.78 | TAAR1 (0.34) | PPARASMN1; SMN2TAAR1CALM1 | |
| SCHEMBL6667517 | 0.77 | PPARA (0.66) | PPARAPPARGALDH1A1ACACBKDM4E | |
| SCHEMBL3043486 | 0.76 | PPARA (0.41) | PPARAPPARGALDH1A1PPARDFABP2 | |
| SCHEMBL2869439 | 0.76 | KCNH2 (0.46) | — | |
| SCHEMBL91178 | 0.75 | THRB (0.46) | PPARAPPARGALDH1A1ACACBTAAR1 | |
| SCHEMBL14998990 | 0.75 | PPARA (0.44) | PPARAPPARGALDH1A1PPARDACACB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439010-B2 | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same | FUJITSU LIMITED (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20050221227-A1 | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same | FUJITSU LIMITED (JP) | 2005-10-06 | — | — | US | disclosed |
| US-6949324-B2 | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same | FUJITSU LIMITED (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20030211407-A1 | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same | FUJITSU LIMITED (JP) | 2003-11-13 | — | — | US | disclosed |
| EP-1349007-A1 | Photosensitive Paste | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-10-01 | — | — | EP | disclosed |
| US-4946921-A | POLYSILICATE CONTAINING HYDROXYPHENYL GROUP | TORAY SILICONE COMPANY LIMITED (JP) | 1990-08-07 | — | — | US | disclosed |
| EP-0342648-A2 | Alkali-soluble organopolysiloxane | TORAY SILICONE COMPANY, LIMITED (JP) | 1989-11-23 | — | — | EP | disclosed |