SCHEMBL4859359

SCHEMBL4859359

C=C(C)C(=O)OCCOC(=O)C1C=CCC(C(=O)O)C1

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ABAT P80404 1/20 0.40
THRB P10828 1/20 0.40
TSHR P16473 3/20 0.36
CA1 P00915 3/20 0.35
CA2 P00918 3/20 0.35
ALDH1A1 P00352 2/20 0.35
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
HTT P42858 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11690583 0.80 ABAT (0.46) ABATTHRBTSHRALDH1A1POLB
SCHEMBL17531128 0.78 THRB (0.47) THRBTSHRCA1CA2ALDH1A1
SCHEMBL4859807 0.76 THRB (0.45) THRBTSHRCA1CA2ALDH1A1
SCHEMBL1152044 0.75 THRB (0.47) THRBTSHRCA1CA2ALDH1A1
SCHEMBL28021283 0.75 ABAT (0.50) ABATTSHRPOLB
SCHEMBL11045391 0.74 THRB (0.44) THRBTSHRCA1CA2ALDH1A1
SCHEMBL17531129 0.74 THRB (0.44) THRBTSHRCA1CA2ALDH1A1
SCHEMBL10040737 0.74 THRB (0.53) THRBTSHRCA1CA2ALDH1A1
SCHEMBL10040880 0.74 THRB (0.53) THRBTSHRCA1CA2ALDH1A1
SCHEMBL1151693 0.73 THRB (0.42) THRBTSHRCA1CA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed