SCHEMBL4859807

SCHEMBL4859807

C=C(C)C(=O)OCCOC(=O)C1C=CC(C(=O)O)CC1

nearest known ligand 0.45

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.45
TSHR P16473 3/20 0.40
ALDH1A1 P00352 3/20 0.39
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
HTT P42858 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
PPM1B O75688 1/20 0.32
PTPN1 P18031 1/20 0.32
PPP1CC P36873 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21841912 0.81 TSHR (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL12216056 0.79 ALDH1A1 (0.51) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL1152044 0.78 THRB (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL21841911 0.76 TSHR (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL2785959 0.76 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL73761 0.76 THRB (0.46) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL75023 0.76 THRB (0.46) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL14473517 0.76 THRB (0.46) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL4859359 0.76 ABAT (0.40) THRBTSHRALDH1A1POLBAPEX1
Benzene SCHEMBL28145673 0.75 THRB (0.65) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed