Water

Water

SCHEMBL486305

CNc1ccccc1.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3008675 0.97
SCHEMBL4454 0.97
SCHEMBL19298582 0.97 TSHR (1.00)
Benzene SCHEMBL17977991 0.97 TSHR (1.00)
Methyl Alcohol SCHEMBL27262934 0.94 TSHR (0.82)
Bromide SCHEMBL9803500 0.93
SCHEMBL4675612 0.93
Iodide SCHEMBL22092509 0.93
Ammonia Solution, Strong SCHEMBL7932140 0.93
Phosphine SCHEMBL11220255 0.93 TSHR (0.93)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108640919-A The matrine derivative and Sophoridine derivative and preparation method thereof of amidine containing aryl or aminoquinoline structure 广西大学 2018-10-12 CN claimed
CN-113773241-B Synthesis method of N-methylindole 太原理工大学 2023-03-10 CN disclosed
CN-113773241-A Synthesis method of N-methylindole 太原理工大学 2021-12-10 CN disclosed
CN-106432248-B The LSD1 of triazole containing pyrimido inhibitor, preparation method and application 郑州大学 2018-11-27 CN disclosed
CN-108752341-A A kind of preparation method of bromo- 7 azaindoles of 5- 南京杰运医药科技有限公司 2018-11-06 CN disclosed
WO-2017071933-A1 COATING AGENT WITH MONOALLOPHANATES BASED ON ALKOXYSILANE-ALKYL ISOCYANATES EVONIK DEGUSSA GMBH (DE) 2017-05-04 WO disclosed
CN-104030987-B DIHYDROOROTATE DEHYDROGENASE INHIBITORS 默克雪兰诺有限公司 2017-04-12 CN disclosed
CN-105264016-A Reinforcing agent for polycarbonate resin, polycarbonate resin composition, and molded article MITSUBISHI CHEM CORP 2016-01-20 CN disclosed
CN-104861956-A Oil and gas field acidification high-temperature corrosion Inhibitor and preparation method thereof UNIV CHINA PETROLEUM 2015-08-26 CN disclosed
CN-104610877-A Titania-containing coating composition and coated article SHINETSU CHEMICAL CO 2015-05-13 CN disclosed
CN-101805501-A Poly carbonate resin composition and manufacture method thereof MITSUBISHI GAS CHEMICAL CO 2010-08-18 CN disclosed
CN-101619169-A Heat-curable silicone resin-epoxy resin composition, and premolded package molded from same SHINETSU CHEMICAL CO 2010-01-06 CN disclosed
CN-101490130-A Polycarbonate resin and optical film using the same MITSUBISHI GAS CHEMICAL CO (JP) 2009-07-22 CN disclosed
CN-101379054-A Piperidine derivatives as CXCR3 receptor antagonists JANSSEN PHARMACEUTICA NV (BE) 2009-03-04 CN disclosed
CN-1903161-A Composition for simultaneously bleaching and coloring of keratin fibres comprising an anionic or non-ionic dye and an asociative polymer OREAL (FR) 2007-01-31 CN disclosed
CN-1076350-C Dimethylfuroxanide derivatives SANKYO CO (JP) 2001-12-19 CN disclosed
EP-0709736-B1 Method for producing compounds used in a positive chemically amplified resist composition FUJI PHOTO FILM CO LTD (JP) 1999-04-21 EP disclosed
US-5693452-A FOR USE IN PRODUCTION OF SEMICONDUCTORS FUJI PHOTO FILM CO., LTD. (JP) 1997-12-02 US disclosed
CN-1152307-A Dimethylfuroxanide derivatives SANKYO CO (JP) 1997-06-18 CN disclosed
EP-0709736-A1 Positive chemically amplified resist composition and method for producing compounds used therein FUJI PHOTO FILM CO., LTD. (JP) 1996-05-01 EP disclosed