Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 2/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 4/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | TTR | P02766 | 1/20 | 0.37 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.36 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.35 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4863407 | 0.81 | TRPA1 (0.39) | TRPA1ATMESR1ESR2ALDH1A1 | |
| SCHEMBL301345 | 0.79 | ALDH1A1 (0.57) | ESR1ESR2ALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL6021075 | 0.79 | ALDH1A1 (0.57) | ESR1ESR2ALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL30388902 | 0.74 | TRPA1 (0.57) | TRPA1ATMESR1ESR2ALDH1A1 | |
| SCHEMBL207038 | 0.74 | TRPA1 (0.57) | TRPA1ATMESR1ESR2ALDH1A1 | |
| SCHEMBL7775093 | 0.73 | TRPA1 (0.81) | TRPA1ATMESR1ESR2ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL1065150 | 0.72 | TRPA1 (0.55) | TRPA1ATMESR1ESR2ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL28109578 | 0.72 | TRPA1 (0.55) | TRPA1ATMESR1ESR2ALDH1A1 | |
| Phosphine SCHEMBL1067227 | 0.72 | TRPA1 (0.55) | TRPA1ATMESR1ESR2ALDH1A1 | |
| Methane SCHEMBL27481984 | 0.72 | TRPA1 (0.55) | TRPA1ATMESR1ESR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7419763-B2 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2008-09-02 | — | — | US | disclosed |
| US-7303859-B2 | Photoresist, photolithography method using the same, and method for producing photoresist | CANON KABUSHIKI KAISHA (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20070141483-A1 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20060263722-A1 | Photoresist, photolithography method using the same, and method for producing photoresist | CANON KABUSHIKI KAISHA (JP) | 2006-11-23 | — | — | US | disclosed |
| US-20060078818-A1 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2006-04-13 | — | — | US | disclosed |
| US-7022463-B2 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2006-04-04 | — | — | US | disclosed |
| US-20050079437-A1 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050053859-A1 | Photoresist, photolithography method using the same, and method for producing photoresist | CANON KABUSHIKI KAISHA (JP) | 2005-03-10 | — | — | US | disclosed |
| US-6849391-B2 | Photoresist, photolithography method using the same, and method for producing photoresist | CANON KABUSHIKI KAISHA (JP) | 2005-02-01 | — | — | US | disclosed |
| US-20030003393-A1 | Photoresist, photolithography method using the same, and method for producing photoresist | CANON KABUSHIKI KASIHA (JP) | 2003-01-02 | — | — | US | disclosed |