SCHEMBL4865704

SCHEMBL4865704

C=CC(=O)OCN1C(=O)C2=C(CCCC2)C1=O

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.36
ALDH1A1 P00352 4/20 0.36
TP53 P04637 3/20 0.36
HIF1A Q16665 3/20 0.36
CYP3A4 P08684 2/20 0.36
HSD17B10 Q99714 1/20 0.36
KDM4E B2RXH2 1/20 0.34
LMNA P02545 1/20 0.34
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HPGD P15428 1/20 0.33
THRB P10828 1/20 0.32
ELANE P08246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1147831 0.84 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4861737 0.81 TSHR (0.47) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL15871832 0.81 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23060731 0.77 LMNA (0.37) TSHRALDH1A1HIF1AHSD17B10KDM4E
SCHEMBL4864684 0.75 TSHR (0.37) TSHRALDH1A1HIF1AKDM4ELMNA
SCHEMBL8736351 0.74
SCHEMBL19334645 0.73 PIN1 (0.47) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL5900157 0.73 NPSR1 (0.55) TSHRALDH1A1CYP3A4HSD17B10SMN1; SMN2
SCHEMBL8747671 0.73 ALDH1A1 (0.53) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL12515479 0.71 KMT2A (0.43) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed