SCHEMBL488963

SCHEMBL488963

OCc1c2ccccc2c(CO)c2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.45
CYP2A6 P11509 2/20 0.42
APOBEC3G Q9HC16 1/20 0.42
IDO1 P14902 1/20 0.40
GABRA1 P14867 1/20 0.40
GABRG2 P18507 1/20 0.40
GABRB3 P28472 1/20 0.40
HSD17B10 Q99714 2/20 0.37
CYP1A2 P05177 2/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
MAOB P27338 1/20 0.37
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
TNNI3 P19429 1/20 0.36
TNNT2 P45379 1/20 0.36
TNNC1 P63316 1/20 0.36
ALDH1A1 P00352 4/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29853841 1.00 TSHR (0.45) TSHRCYP2A6APOBEC3GIDO1GABRA1
SCHEMBL14008502 0.89 MEN1 (0.41) TSHRCYP2A6APOBEC3GIDO1HSD17B10
SCHEMBL1072230 0.87 DRD4 (0.37) TSHRCYP2A6APOBEC3GIDO1GABRA1
SCHEMBL2397625 0.87 MAOA (0.41) TSHRCYP2A6APOBEC3GIDO1GABRA1
SCHEMBL31283575 0.87 CYP3A4 (0.50) TSHRCYP2A6APOBEC3GGABRA1GABRG2
SCHEMBL488903 0.87 CYP3A4 (0.50) TSHRCYP2A6APOBEC3GGABRA1GABRG2
SCHEMBL59671 0.81 HTR2A (0.60) HSD17B10CYP1A2CYP2C9CYP2C19MEN1
SCHEMBL29367221 0.81 HTR2A (0.60) HSD17B10CYP1A2CYP2C9CYP2C19MEN1
SCHEMBL392193 0.81 KDM4E (0.39) TSHRCYP2A6APOBEC3GIDO1HSD17B10
SCHEMBL6367803 0.81 KDM4E (0.41) TSHRCYP2A6IDO1GABRA1GABRG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1805561-B1 ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS MERCK PATENT GMBH (DE) 2018-10-24 EP claimed
US-8105836-B2 Chemical inhibitors of mismatch repair MORPHOTEK, INC. (US) 2012-01-31 US claimed
EP-1351565-B1 CHEMICAL INHIBITORS OF MISMATCH REPAIR MORPHOTEK INC (US) 2011-03-16 EP claimed
US-6982169-B2 Chemical inhibitors of mismatch repair MORPHOTEK, INC. (US) 2006-01-03 US claimed
EP-1351565-A4 CHEMICAL INHIBITORS OF MISMATCH REPAIR MORPHOTEK INC (US) 2005-05-25 EP claimed
EP-1417329-A4 METHODS FOR GENERATING ANTIBIOTIC RESISTANT MICROBES AND NOVEL ANTIBIOTICS MORPHOTEK INC (US) 2005-05-11 EP claimed
EP-1417329-A1 METHODS FOR GENERATING ANTIBIOTIC RESISTANT MICROBES AND NOVEL ANTIBIOTICS Morphotek Inc. (US) 2004-05-12 EP claimed
EP-1351565-A1 CHEMICAL INHIBITORS OF MISMATCH REPAIR Morphotek Inc. (US) 2003-10-15 EP claimed
US-20030143586-A1 Genetic hypermutability of plants for gene discovery and diagnosis MORPHOTEK, INC. 2003-07-31 US claimed
US-20030091997-A1 Chemical inhibitors of mismatch repair EISAI, INC. 2003-05-15 US claimed
WO-2003031937-A2 GENETIC HYPERMUTABILITY OF PLANTS FOR GENE DISCOVERY AND DIAGNOSIS MORPHOTEK, INC. (US) 2003-04-17 WO claimed
US-20030068808-A1 Methods for generating antibiotic resistant microbes and novel antibiotics MORPHOTEK, INC. 2003-04-10 US claimed
US-6544717-B2 Antireflective coating TOKYO OHKA KOGYO CO., LTD. (JP) 2003-04-08 US claimed
WO-2003012130-A1 METHODS FOR GENERATING ANTIBIOTIC RESISTANT MICROBES AND NOVEL ANTIBIOTICS MORPHOTEK INC. (US) 2003-02-13 WO claimed
WO-2002054856-A1 CHEMICAL INHIBITORS OF MISMATCH REPAIR MORPHOTEK INC. (US) 2002-07-18 WO claimed
US-20010018163-A1 Undercoating composition for photolithographic resist TOKYO OHKA KOGYO CO., LTD. (JP) 2001-08-30 US claimed
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
US-6284428-B1 FOR FORMING OF ANTIREFLECTION UNDERCOATING LAYER TO INTERVENE BETWEEN SURFACE OF SUBSTRATE AND PHOTORESIST LAYER TO BE PATTERNED IN MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICES TOKYO OHKA KOGYO CO., LTD, (JP) 2001-09-04 US disclosed
US-20010018163-A1 Undercoating composition for photolithographic resist TOKYO OHKA KOGYO CO., LTD. (JP) 2001-08-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030091997-A1 Chemical inhibitors of mismatch repair MSH2, MSH6, PMS2 TSHR 4665/4885CYP2A6 2364/4885APOBEC3G 282/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.