SCHEMBL4902204

SCHEMBL4902204

CCS(=O)(=O)ON=C(c1ccccc1)C(F)(F)Oc1cccs1

nearest known ligand 0.34

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.34
NPC1 O15118 2/20 0.34
MEN1 O00255 1/20 0.34
PKM P14618 1/20 0.34
HPGD P15428 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LMNA P02545 2/20 0.33
NPSR1 Q6W5P4 1/20 0.33
PLA2G7 Q13093 1/20 0.32
HTR1A P08908 1/20 0.31
ADORA3 P0DMS8 1/20 0.31
CCKAR P32238 1/20 0.31
HTR5A P47898 1/20 0.31
ALDH1A1 P00352 3/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.30
NR1H2 P55055 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4901622 0.76
SCHEMBL4896478 0.75 PPARG (0.36) KMT2ALMNANPSR1ALDH1A1MAPT
SCHEMBL4905378 0.74 CES1 (0.41) HPGDLMNANPSR1MAPT
SCHEMBL4902695 0.74 PSIP1 (0.35) KMT2AMEN1HPGDRAB9ANPSR1
SCHEMBL4903541 0.73 NPSR1 (0.34) KMT2ANPC1MEN1HPGDRAB9A
SCHEMBL4895434 0.72 ALDH1A1 (0.35) KMT2AMEN1HPGDRAB9ALMNA
SCHEMBL4902710 0.71 RAB9A (0.35) KMT2AMEN1HPGDRAB9ASMN1; SMN2
SCHEMBL4896528 0.70 ELANE (0.39) SMN1; SMN2NPSR1MAPT
SCHEMBL4902045 0.70 NPSR1 (0.32) NPSR1
SCHEMBL4901474 0.70 QRFPR (0.34) KMT2AMEN1RAB9ASMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed