SCHEMBL4902695

SCHEMBL4902695

CCS(=O)(=O)ON=C(c1ccccc1)C(F)(F)S(=O)(=O)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PSIP1 O75475 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
RAB9A P51151 1/20 0.35
ALDH1A1 P00352 4/20 0.34
HPGD P15428 2/20 0.34
MAPT P10636 1/20 0.34
KMT2A Q03164 4/20 0.33
MEN1 O00255 2/20 0.33
HTT P42858 2/20 0.33
HSD11B1 P28845 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GAA P10253 1/20 0.33
HTR7 P34969 1/20 0.33
POLB P06746 1/20 0.33
TSHR P16473 1/20 0.33
NR1I2 O75469 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4895537 0.91 TDP1 (0.35) PSIP1NPSR1RAB9AALDH1A1HPGD
SCHEMBL4903190 0.90 HSD11B1 (0.45) RAB9AALDH1A1MAPTKMT2AMEN1
SCHEMBL6873824 0.89 PTGS2 (0.36) MAPTKMT2AMEN1POLB
SCHEMBL4902710 0.88 RAB9A (0.35) PSIP1NPSR1RAB9AALDH1A1HPGD
SCHEMBL6875352 0.87 PTGS2 (0.37) KMT2AMEN1POLB
SCHEMBL4891641 0.86 KMT2A (0.35) NPSR1RAB9AALDH1A1MAPTKMT2A
SCHEMBL4900868 0.84 KMT2A (0.34) PSIP1RAB9AALDH1A1HPGDMAPT
SCHEMBL4897641 0.84 KMT2A (0.36) NPSR1RAB9AALDH1A1HPGDMAPT
SCHEMBL6876264 0.82 RAB9A (0.36) NPSR1RAB9AALDH1A1HPGDMAPT
SCHEMBL4903237 0.82 HSD11B1 (0.43) RAB9AALDH1A1MAPTKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed