Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.38 |
| ▸ | AHR | P35869 | 1/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.37 |
| ▸ | CRHR1 | P34998 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | GABRP | O00591 | 1/20 | 0.37 |
| ▸ | GABRD | O14764 | 1/20 | 0.37 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.37 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.37 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL491055 | 0.88 | AHR (0.41) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL491173 | 0.86 | NPC1 (0.37) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL1425804 | 0.84 | CYP2A6 (0.40) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL18037939 | 0.78 | CYP1A2 (0.45) | SMN1; SMN2NPC1ALDH1A1RAB9ATSHR | |
| SCHEMBL491288 | 0.77 | CYP1A2 (0.40) | SMN1; SMN2NPC1ALDH1A1RAB9ATP53 | |
| SCHEMBL490732 | 0.76 | GABRA1 (0.36) | SMN1; SMN2PDK2KMT2AGABRA1GABRA5 | |
| SCHEMBL80380 | 0.75 | CHRM1 (0.41) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL3389825 | 0.70 | MEN1 (0.52) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL29416163 | 0.69 | AHR (0.52) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD | |
| SCHEMBL2934558 | 0.69 | AHR (0.52) | SMN1; SMN2NPC1ALDH1A1RAB9AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8741536-B2 | Light sensitive coating compositions useful for lithographic elements | IBF Industria Basileira de Filmes S/A (BR) | 2014-06-03 | — | — | US | claimed |
| EP-1673663-B1 | LIGHT SENSITIVE COATING COMPOSITIONS FOR LITHOGRAPHIC ELEMENTS | IBF IND BRASILEIRA DE FILMES SA (BR) | 2011-03-23 | — | — | EP | claimed |
| US-20070202434-A1 | Light Sensitive Coating Compositions Useful For Lithographic Elements | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2007-08-30 | — | — | US | claimed |
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | disclosed |
| US-9341743-B2 | Photosensitive resin composition for color filter, and color filter prepared using the same | CHEIL INDUSTRIES INC. (KR) | 2016-05-17 | — | — | US | disclosed |
| US-9297940-B2 | Photosensitive resin composition and color filter prepared using the same | CHEIL INDUSTRIES INC. (KR) | 2016-03-29 | — | — | US | disclosed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | disclosed |
| US-9146465-B2 | Photosensitive resin composition and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2015-09-29 | — | — | US | disclosed |
| US-20150053900-A1 | Photosensitive Resin Composition for Color Filter, and Color Filter Prepared Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-02-26 | — | — | US | disclosed |
| US-20150028271-A1 | Photosensitive Resin Composition and Color Filter Prepared Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-01-29 | — | — | US | disclosed |
| US-8920689-B2 | Photosensitive resin composition for color filter and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2014-12-30 | — | — | US | disclosed |
| US-5723260-A | LIGHT SENSITIVE ELEMENTS AND STORAGE STABILITY | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| US-5686231-A | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0780731-A2 | Photopolymerizable composition for a color filter, color filter and liquid crystal display device | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0763779-A2 | Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0756204-A1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0747773-A1 | METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0738929-A2 | Photopolymerizable sensitive material | Mitsubishi Chemical Corporation (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0723167-A2 | Photopolymerizable composition for a color filter | Mitsubishi Chemical Corporation (JP) | 1996-07-24 | — | — | EP | disclosed |