Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.36 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.36 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.36 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.36 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | PIM1 | P11309 | 1/20 | 0.33 |
| ▸ | CSNK2A2 | P19784 | 1/20 | 0.33 |
| ▸ | CSNK2B | P67870 | 1/20 | 0.33 |
| ▸ | PIM3 | Q86V86 | 1/20 | 0.33 |
| ▸ | PIM2 | Q9P1W9 | 1/20 | 0.33 |
| ▸ | NQO2 | P16083 | 1/20 | 0.33 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.32 |
| ▸ | PTGES | O14684 | 6/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5150338 | 0.78 | ALDH1A1 (0.38) | GABRA1GABRA5GABRA3GABRA2GABRB2 | |
| SCHEMBL1425804 | 0.77 | CYP2A6 (0.40) | GABRA1GABRA5GABRA3GABRA2GABRB2 | |
| SCHEMBL490759 | 0.76 | SMN1; SMN2 (0.40) | GABRA1GABRA5GABRA3GABRA2GABRB2 | |
| SCHEMBL18037939 | 0.74 | CYP1A2 (0.45) | SMN1; SMN2MAPTPTGESKMT2ATAAR1 | |
| SCHEMBL491173 | 0.73 | NPC1 (0.37) | PDK2SMN1; SMN2MAPTKMT2A | |
| SCHEMBL6298557 | 0.69 | HSP90AA1 (0.40) | PDK2SMN1; SMN2MAPTNQO2KMT2A | |
| SCHEMBL2496616 | 0.68 | CHRM1 (0.38) | GABRA1GABRA5GABRA3GABRA2GABRB2 | |
| SCHEMBL491288 | 0.67 | CYP1A2 (0.40) | PDK2SMN1; SMN2MAPTGAATAAR1 | |
| SCHEMBL5555835 | 0.66 | PDK2 (0.41) | PDK2SMN1; SMN2MAPTCYP3A4KMT2A | |
| SCHEMBL491344 | 0.65 | TAAR1 (0.36) | PDK2SMN1; SMN2GAAKMT2ATAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| US-8741536-B2 | Light sensitive coating compositions useful for lithographic elements | IBF Industria Basileira de Filmes S/A (BR) | 2014-06-03 | — | — | US | claimed |
| EP-1673663-B1 | LIGHT SENSITIVE COATING COMPOSITIONS FOR LITHOGRAPHIC ELEMENTS | IBF IND BRASILEIRA DE FILMES SA (BR) | 2011-03-23 | — | — | EP | claimed |
| US-20070202434-A1 | Light Sensitive Coating Compositions Useful For Lithographic Elements | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2007-08-30 | — | — | US | claimed |
| EP-1673663-A1 | LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | IBF Industria Brasileira de Filmes Ltda. (BR) | 2006-06-28 | — | — | EP | claimed |
| WO-2005029186-A1 | LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | IBF Indústria Brasileira de Filmes Ltda. (BR) | 2005-03-31 | — | — | WO | claimed |
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | disclosed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | disclosed |
| US-8741536-B2 | Light sensitive coating compositions useful for lithographic elements | IBF Industria Basileira de Filmes S/A (BR) | 2014-06-03 | — | — | US | disclosed |
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-5723260-A | LIGHT SENSITIVE ELEMENTS AND STORAGE STABILITY | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| US-5686231-A | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0763779-A2 | Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0756204-A1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0747773-A1 | METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0738929-A2 | Photopolymerizable sensitive material | Mitsubishi Chemical Corporation (JP) | 1996-10-23 | — | — | EP | disclosed |