Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AHR | P35869 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.38 |
| ▸ | HSP90AB1 | P08238 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | SI | P14410 | 1/20 | 0.38 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
| ▸ | CRHR1 | P34998 | 4/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL490759 | 0.88 | SMN1; SMN2 (0.40) | AHRHSD11B1RAB9AALDH1A1KDM4E | |
| SCHEMBL491173 | 0.80 | NPC1 (0.37) | AHRHSD11B1RAB9AALDH1A1KDM4E | |
| SCHEMBL80380 | 0.79 | CHRM1 (0.41) | HSD11B1RAB9AALDH1A1TP53SLC6A3 | |
| SCHEMBL11278246 | 0.76 | ALDH1A1 (0.45) | RAB9AALDH1A1TP53NPC1LMNA | |
| SCHEMBL31379950 | 0.72 | TP53 (0.42) | HSD11B1ALDH1A1TP53SLC6A4SLC6A3 | |
| SCHEMBL29624840 | 0.70 | AHR (0.64) | AHRHSD11B1RAB9AHSP90AA1HSP90AB1 | |
| SCHEMBL464507 | 0.70 | AHR (0.64) | AHRHSD11B1RAB9AHSP90AA1HSP90AB1 | |
| SCHEMBL308751 | 0.69 | HSD11B1 (0.38) | HSD11B1KDM4EGAACRHR1LMNA | |
| SCHEMBL11852382 | 0.67 | TP53 (0.41) | HSD11B1ALDH1A1TP53SLC6A4SLC6A3 | |
| SCHEMBL18037939 | 0.64 | CYP1A2 (0.45) | RAB9AHSP90AA1ALDH1A1KDM4ENPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| EP-0756204-B1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEM CORP (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-5837422-A | ON A SUSTRATE CONTATINING ADDITION POLYMERIZABLE UNSATURATED BONDS WITH AND WITHOUT URETHANE BONDS; HIGH SENSITIVITY TO LIGNT IN VISIBLE REGION AND EXCELLENT DEVELOPABILITY | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-11-17 | — | — | US | disclosed |
| US-5800965-A | LIGHT SENSITIVE LITHOGRAPHIC PLATES AND ADDITION POLYMERIZABLE MONOMERS AND PHOSPHORIC ACID DERIVATIVES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-09-01 | — | — | US | disclosed |
| US-5723260-A | LIGHT SENSITIVE ELEMENTS AND STORAGE STABILITY | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| US-5686231-A | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0763779-A2 | Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0756204-A1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0747773-A1 | METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0738929-A2 | Photopolymerizable sensitive material | Mitsubishi Chemical Corporation (JP) | 1996-10-23 | — | — | EP | disclosed |