Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.37 |
| ▸ | RAB9A | P51151 | 5/20 | 0.37 |
| ▸ | HPGD | P15428 | 4/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.35 |
| ▸ | AHR | P35869 | 1/20 | 0.35 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.35 |
| ▸ | CRHR1 | P34998 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL490759 | 0.86 | SMN1; SMN2 (0.40) | NPC1RAB9AHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL6298557 | 0.83 | HSP90AA1 (0.40) | NPC1RAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL491055 | 0.80 | AHR (0.41) | NPC1RAB9AHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL490732 | 0.73 | GABRA1 (0.36) | SMN1; SMN2PDK2KMT2AMAPT | |
| SCHEMBL16424727 | 0.71 | AHR (0.45) | NPC1RAB9AHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL80409 | 0.70 | ALDH1A1 (0.40) | NPC1RAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL1425804 | 0.70 | CYP2A6 (0.40) | NPC1RAB9AHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL80380 | 0.68 | CHRM1 (0.41) | NPC1RAB9AHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL18037939 | 0.65 | CYP1A2 (0.45) | NPC1RAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL491334 | 0.65 | HTR2A (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| EP-0756204-B1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEM CORP (JP) | 2000-09-20 | — | — | EP | disclosed |
| US-5800965-A | LIGHT SENSITIVE LITHOGRAPHIC PLATES AND ADDITION POLYMERIZABLE MONOMERS AND PHOSPHORIC ACID DERIVATIVES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-09-01 | — | — | US | disclosed |
| EP-0851299-A1 | Photosensitive lithographic printing plate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-07-01 | — | — | EP | disclosed |
| US-5723260-A | LIGHT SENSITIVE ELEMENTS AND STORAGE STABILITY | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| US-5686231-A | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0763779-A2 | Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-03-19 | — | — | EP | disclosed |
| EP-0756204-A1 | Photopolymerizable composition and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0747773-A1 | METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0738929-A2 | Photopolymerizable sensitive material | Mitsubishi Chemical Corporation (JP) | 1996-10-23 | — | — | EP | disclosed |