SCHEMBL1425804

SCHEMBL1425804

Clc1ccccc1C1=NC(c2ccccc2Cl)(C2(c3ccccc3Cl)N=C(c3ccccc3Cl)C(c3ccccc3Cl)=N2)N=C1c1ccccc1Cl

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 1/20 0.40
SMN1; SMN2 Q16637 3/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
TP53 P04637 1/20 0.39
HPGD P15428 1/20 0.39
LDHA P00338 1/20 0.39
ALDH1A1 P00352 2/20 0.37
LMNA P02545 2/20 0.37
HSD11B1 P28845 1/20 0.37
TAAR1 Q96RJ0 1/20 0.37
IDO1 P14902 1/20 0.36
PDK2 Q15119 3/20 0.36
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
NOTUM Q6P988 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL490759 0.84 SMN1; SMN2 (0.40) SMN1; SMN2NPC1RAB9ATP53HPGD
SCHEMBL8663506 0.83 CYP1A2 (0.46) CYP2A6RAB9ALDHAALDH1A1IDO1
SCHEMBL18037939 0.82 CYP1A2 (0.45) CYP2A6SMN1; SMN2NPC1RAB9AALDH1A1
SCHEMBL1874215 0.77 MEN1 (0.49) SMN1; SMN2NPC1RAB9ATP53HPGD
SCHEMBL491288 0.77 CYP1A2 (0.40) SMN1; SMN2NPC1RAB9ATP53ALDH1A1
SCHEMBL490732 0.77 GABRA1 (0.36) SMN1; SMN2TAAR1PDK2GAAGABRA1
SCHEMBL1877506 0.74 TAAR1 (0.40) SMN1; SMN2NPC1RAB9AHPGDALDH1A1
SCHEMBL5150338 0.74 ALDH1A1 (0.38) SMN1; SMN2NPC1RAB9ATP53ALDH1A1
SCHEMBL11594199 0.74 CRHBP (0.37) CYP2A6ALDH1A1LMNATAAR1TSHR
SCHEMBL491344 0.74 TAAR1 (0.36) SMN1; SMN2NPC1RAB9ATP53ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10254646-B2 Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2019-04-09 US claimed
US-20160026080-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2016-01-28 US claimed
EP-2937733-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS IBF - Indústria Brasileira de Filmes S/A (BR) 2015-10-28 EP claimed
US-8741536-B2 Light sensitive coating compositions useful for lithographic elements IBF Industria Basileira de Filmes S/A (BR) 2014-06-03 US claimed
EP-1673663-B1 LIGHT SENSITIVE COATING COMPOSITIONS FOR LITHOGRAPHIC ELEMENTS IBF IND BRASILEIRA DE FILMES SA (BR) 2011-03-23 EP claimed
US-20070202434-A1 Light Sensitive Coating Compositions Useful For Lithographic Elements IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2007-08-30 US claimed
EP-1673663-A1 LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS IBF Industria Brasileira de Filmes Ltda. (BR) 2006-06-28 EP claimed
WO-2005029186-A1 LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS IBF Indústria Brasileira de Filmes Ltda. (BR) 2005-03-31 WO claimed
US-10254646-B2 Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2019-04-09 US disclosed
US-20160026080-A1 COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2016-01-28 US disclosed
US-8741536-B2 Light sensitive coating compositions useful for lithographic elements IBF Industria Basileira de Filmes S/A (BR) 2014-06-03 US disclosed
US-20070202434-A1 Light Sensitive Coating Compositions Useful For Lithographic Elements IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) 2007-08-30 US disclosed
EP-1673663-A1 LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS IBF Industria Brasileira de Filmes Ltda. (BR) 2006-06-28 EP disclosed
WO-2005029186-A1 LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS IBF Indústria Brasileira de Filmes Ltda. (BR) 2005-03-31 WO disclosed