Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.43 |
| ▸ | RAB9A | P51151 | 4/20 | 0.43 |
| ▸ | LMNA | P02545 | 5/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | TERT | O14746 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | GSK3B | P49841 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6393160 | 0.89 | LMNA (0.50) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL12058190 | 0.83 | NPC1 (0.48) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL21693343 | 0.82 | RAB9A (0.66) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL13922023 | 0.82 | NPC1 (0.47) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL9277488 | 0.82 | NPC1 (0.47) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL1720545 | 0.79 | LMNA (0.58) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL1104224 | 0.76 | RAB9A (0.42) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL10089270 | 0.75 | NPC1 (0.41) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL9479429 | 0.75 | LMNA (0.74) | NPC1RAB9ALMNAHPGDALDH1A1 | |
| SCHEMBL3765289 | 0.73 | ALDH1A1 (0.39) | NPC1RAB9ALMNAHPGDALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8165438-A | — | — | None | — | — | JP | disclosed |
| US-10969685-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-06 | — | — | US | disclosed |
| EP-3130465-B1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA NV (BE) | 2020-05-13 | — | — | EP | disclosed |
| EP-3130465-B1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA NV (BE) | 2020-05-13 | — | — | EP | disclosed |
| US-20180236759-A1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA NV (BE) | 2018-08-23 | — | — | US | disclosed |
| WO-2017025307-A1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2017-02-16 | — | — | WO | disclosed |
| WO-2017025307-A1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2017-02-16 | — | — | WO | disclosed |
| EP-3130465-A1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2017-02-15 | — | — | EP | disclosed |
| EP-3130465-A1 | HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2017-02-15 | — | — | EP | disclosed |
| US-20150086927-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-26 | — | — | US | disclosed |
| EP-2028548-A1 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2009-02-25 | — | — | EP | disclosed |
| US-20090011363-A1 | Photopolymer Composition Usable for Lithographic Plates | BANK OF AMERICA, N.A., AS AGENT | 2009-01-08 | — | — | US | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| US-20080248424-A1 | Photopolymer Composition Suitable for Lithographic Printing Plates | BANK OF AMERICA, N.A., AS AGENT | 2008-10-09 | — | — | US | disclosed |
| EP-1903399-A1 | Method for developing and sealing of lithographic printing plates | EASTMAN KODAK COMPANY (US) | 2008-03-26 | — | — | EP | disclosed |
| EP-1868036-A1 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2007-12-19 | — | — | EP | disclosed |
| US-6866981-B2 | Mixture of cationic polymer containing unsaturated aromatic compound and sulfonated aromatic compound, photoinitiator and acid generator | MITSUBISHI PAPER MILLS LIMITED (JP) | 2005-03-15 | — | — | US | disclosed |
| US-20030190548-A1 | Mixture of cationic polymer containing unsaturated aromatic compound and sulfonated aromatic compound, photoinitiator and acid generator | MITSUBISHI PAPER MILLS LIMITED (JP) | 2003-10-09 | — | — | US | disclosed |
| JP-H08165438-A | ANTISTATIC AGENT | MITSUBISHI PAPER MILLS LTD | 1996-06-25 | — | — | JP | disclosed |