Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL6515866 | 1.00 | — | — | |
| Water SCHEMBL1615786 | 1.00 | — | — | |
| Water SCHEMBL27611207 | 1.00 | — | — | |
| Water SCHEMBL10448733 | 1.00 | — | — | |
| Water SCHEMBL21079284 | 0.82 | — | — | |
| Water SCHEMBL20573062 | 0.82 | — | — | |
| Methane SCHEMBL20952335 | 0.82 | — | — | |
| Water SCHEMBL20544764 | 0.82 | — | — | |
| Water SCHEMBL20536946 | 0.82 | — | — | |
| Water SCHEMBL22228991 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170350752-A1 | LIGHT EMITTING STRUCTURES AND SYSTEMS ON THE BASIS OF GROUP IV MATERIAL(S) FOR THE ULTRAVIOLET AND VISIBLE SPECTRAL RANGES | LAVCHIEV VENTSISLAV METODIEV (AT) | 2017-12-07 | — | — | US | claimed |
| EP-3242336-A1 | LIGHT EMITTING STRUCTURES AND SYSTEMS ON THE BASIS OF GROUP-IV MATERIALS FOR THE ULTRAVIOLET AND VISIBLE SPECTRAL RANGES BASED ON SURFACE PLASMONS AND SURFACE PLASMON POLARITONS | Lavchiev, Ventsislav (AT) | 2017-11-08 | — | — | EP | claimed |
| US-12040229-B2 | Method for forming a structure with a hole | ASM IP HOLDING B.V. (NL) | 2024-07-16 | — | — | US | disclosed |
| US-20230084173-A1 | METHOD FOR FORMING A STRUCTURE WITH A HOLE | ASM IP HOLDING B.V. (NL) | 2023-03-16 | — | — | US | disclosed |
| US-11594450-B2 | Method for forming a structure with a hole | ASM IP HOLDING B.V. (NL) | 2023-02-28 | — | — | US | disclosed |
| CN-112593083-A | Process for recovering germanium from germanium-containing luminescent glass microcrystalline material | 胡冲丽 | 2021-04-02 | — | — | CN | disclosed |
| US-20210057275-A1 | METHOD FOR FORMING A STRUCTURE WITH A HOLE | ASM IP HOLDING B.V. (NL) | 2021-02-25 | — | — | US | disclosed |
| US-20080303069-A1 | TWO STEP PHOTORESIST STRIPPING METHOD SEQUENTIALLY USING ION ACTIVATED AND NON-ION ACTIVATED NITROGEN CONTAINING PLASMAS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-12-11 | — | — | US | disclosed |