Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | GSK3B | P49841 | 1/20 | 0.40 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | EDNRA | P25101 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.40 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8664760 | 0.85 | NPC1 (0.49) | NPC1RAB9AALDH1A1CLK4MAPT | |
| SCHEMBL11595707 | 0.83 | KDM4E (0.46) | NPC1RAB9AHPGDALDH1A1CLK4 | |
| SCHEMBL150156 | 0.83 | ALDH1A1 (0.46) | NPC1RAB9AALDH1A1MAPTNPSR1 | |
| SCHEMBL491080 | 0.80 | GSK3B (0.45) | ALDH1A1GSK3BMAPTMEN1KMT2A | |
| SCHEMBL8664728 | 0.79 | CYP1A2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1MEN1 | |
| SCHEMBL11278246 | 0.78 | ALDH1A1 (0.45) | SMN1; SMN2NPC1RAB9AHPGDALDH1A1 | |
| SCHEMBL7538061 | 0.77 | KMT2A (0.38) | SMN1; SMN2NPC1RAB9AHPGDALDH1A1 | |
| SCHEMBL8664748 | 0.77 | CYP1A2 (0.48) | SMN1; SMN2NPC1RAB9AHPGDALDH1A1 | |
| SCHEMBL3947663 | 0.75 | HPGD (0.59) | SMN1; SMN2NPC1RAB9AHPGDALOX5 | |
| SCHEMBL490794 | 0.74 | RELA (0.40) | SMN1; SMN2NPC1RAB9AALDH1A1GLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| US-8034538-B2 | Negative-working imageable elements | EASTMAN KODAK COMPANY (US) | 2011-10-11 | — | — | US | disclosed |
| EP-0999473-A1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-05-10 | — | — | EP | disclosed |
| US-6060216-A | USING AS AN ETHYLENICALLY UNSATURATED COMPOUND A COMPOUND IN WHICH AN ISOCYANURATE RING AND AN ACRYLATE (OR METHACRYLATE) ARE BONDED BY A FLEXIBLE ALKYLENE OXIDE GROUP (SUCH AS POLYETHYLENE OR POLYPROPYLENE OXIDE AND AN ALKYLENE GROUP | HITACHI CHEMICAL CO., LTD. (JP) | 2000-05-09 | — | — | US | disclosed |
| US-6004725-A | IMPROVED ADHESION AND RESOLUTION, NEGATIVE ACTING, ACRYLATE FUNCTIONAL ISOCYANATE TRIMER | MORTON INTERNATIONAL, INC. (US) | 1999-12-21 | — | — | US | disclosed |
| EP-0962827-A2 | Photoimageable composition having improved photoinitiator system | Nichigo-Morton Co Ltd (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5939238-A | Photoimageable composition having improved photoinitiator system | MORTON INTERNATIONAL, INC. (US) | 1999-08-17 | — | — | US | disclosed |
| EP-0927911-A2 | Photoimageable compositions containing photopolymerizable urethane oligomers | Nichigo-Morton Co Ltd (JP) | 1999-07-07 | — | — | EP | disclosed |
| EP-0919870-A1 | Photosensitive resin composition and photosensitive element using the resin composition | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| US-5744282-A | CONSISTS OF AN ACRYLIC BINDER POLYMER, ATLEAST ONE PHOTOPOLYMERIZABLE COMPOUND HAVING A POLYMERIZABLE DOUBLE BOND, A PHOTOINITIATOR AND A DICYANDIAMIDE; PHOTOSENSITIVITY, ADHESIION, FLEXIBILITY, PLATING/AND CHEMICAL RESISTANCE | HITACHI CHEMICAL CO., LTD. (JP) | 1998-04-28 | — | — | US | disclosed |
| EP-0738927-A2 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1996-10-23 | — | — | EP | disclosed |
| US-4264710-A | AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-04-28 | — | — | US | disclosed |