Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSK3B | P49841 | 1/20 | 0.45 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | MAOA | P21397 | 1/20 | 0.42 |
| ▸ | MAOB | P27338 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.40 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.40 |
| ▸ | STAT3 | P40763 | 2/20 | 0.40 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.40 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.40 |
| ▸ | ACP1 | P24666 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8664760 | 0.81 | NPC1 (0.49) | KDM4EALDH1A1MAPT | |
| SCHEMBL491020 | 0.80 | SMN1; SMN2 (0.45) | GSK3BMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL150156 | 0.79 | ALDH1A1 (0.46) | KDM4EALDH1A1MAPT | |
| SCHEMBL11595707 | 0.79 | KDM4E (0.46) | KDM4EALDH1A1MAPT | |
| SCHEMBL91929 | 0.78 | MAOA (0.56) | GSK3BMAPKAPK2MEN1KMT2ATHRB | |
| SCHEMBL3419967 | 0.78 | MAOA (0.56) | GSK3BMAPKAPK2MEN1KMT2ATHRB | |
| SCHEMBL103904 | 0.76 | MAOB (0.61) | GSK3BMAPKAPK2MEN1KMT2AMAOA | |
| SCHEMBL30757515 | 0.76 | MAOB (0.61) | GSK3BMAPKAPK2MEN1KMT2AMAOA | |
| 1,4-Dimethoxybenzene SCHEMBL28617696 | 0.76 | MAOB (0.61) | GSK3BMAPKAPK2MEN1KMT2AMAOA | |
| SCHEMBL20282381 | 0.75 | MAOA (0.53) | GSK3BMAPKAPK2MEN1KMT2ATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8632937-B2 | UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | EASTMAN KODAK COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| EP-2396173-A1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS | Eastman Kodak Company (US) | 2011-12-21 | — | — | EP | disclosed |
| US-8034538-B2 | Negative-working imageable elements | EASTMAN KODAK COMPANY (US) | 2011-10-11 | — | — | US | disclosed |
| US-20110223540-A1 | GUMMING COMPOSITIONS WITH NANO-PARTICLES FOR IMPROVING SCRATCH SENSITIVITY IN IMAGE AND NON-IMAGE AREAS OF LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY | 2011-09-15 | — | — | US | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2005054952-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-06-16 | — | — | WO | disclosed |
| WO-2004111731-A1 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-12-23 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-4332884-A | USING A DIOXIME CHELATING AGENT | RICOH CO., LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| US-4315068-A | CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS | RICOH CO., LTD. (JP) | 1982-02-09 | — | — | US | disclosed |
| US-4306014-A | AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM | RICOH CO., LTD. (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |