SCHEMBL491203

SCHEMBL491203

CC(C)C(OO)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2C P18825 2/20 0.41
KDM4E B2RXH2 2/20 0.41
LMNA P02545 2/20 0.41
ADRA2A P08913 1/20 0.41
HIF1A Q16665 1/20 0.41
THRB P10828 1/20 0.41
TAAR1 Q96RJ0 3/20 0.40
ALDH1A1 P00352 2/20 0.40
CYP3A4 P08684 2/20 0.39
KMT2A Q03164 2/20 0.39
CHRM2 P08172 1/20 0.39
ADRA1A P35348 1/20 0.39
RGS12 O14924 1/20 0.39
GLA P06280 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
PKM P14618 1/20 0.39
ALOX15 P16050 1/20 0.39
TSHR P16473 1/20 0.39
ALOX12 P18054 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2251267 0.82 ADRA2A (0.54) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL892810 0.80 THRB (0.44) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL1157986 0.80 THRB (0.44) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL354931 0.79 ADRA2C (0.57) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL14392562 0.79 TRPA1 (0.47) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL12884228 0.78 THRB (0.57) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL9911361 0.78 THRB (0.57) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL15113559 0.78 THRB (0.57) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL9619659 0.77 LMNA (0.43) ADRA2CKDM4ELMNAADRA2AHIF1A
SCHEMBL13403919 0.76 THRB (0.41) ADRA2CKDM4ELMNAADRA2AHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 360 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013188496-A2 CORROSION RESISTANT ADDITIVE COMPOSITIONS AND COATING COMPOSITIONS EMPLOYING THE SAME CBI POLYMERS, INC. (US) 2013-12-19 WO claimed
US-20130327992-A1 CORROSION RESISTANT ADDITIVE COMPOSITIONS AND COATING COMPOSITIONS EMPLOYING THE SAME CBI POLYMERS, INC. (US) 2013-12-12 US claimed
US-7652128-B2 Toner composition XEROX CORPORATION (US) 2010-01-26 US claimed
US-20090142692-A1 LOW MOLECULAR WEIGHT LATEX AND TONER COMPOSITIONS COMPRISING THE SAME XEROX CORPORATION (US) 2009-06-04 US claimed
US-20060100300-A1 Toner composition XEROX CORPORATION 2006-05-11 US claimed
CN-110297404-B Toner, developer, toner cartridge, process cartridge, image forming apparatus, and image forming method 富士胶片商业创新有限公司 2024-07-12 CN disclosed
CN-118011746-A Toner, developer, toner cartridge, process cartridge, image forming apparatus, and image forming method 富士胶片商业创新有限公司 2024-05-10 CN disclosed
CN-118011745-A Toner, developer, toner cartridge, process cartridge, image forming apparatus, and image forming method 富士胶片商业创新有限公司 2024-05-10 CN disclosed
US-20240153687-A1 COMPOSITION HAVING MAGNETOSTRICTIVE PROPERTIES, AND CURED PRODUCT THEREOF TOHOKU UNIVERSITY (JP) 2024-05-09 US disclosed
CN-112286017-B Toner and method for producing the same 佳能株式会社 2024-03-19 CN disclosed
CN-112286019-B Toner and method for producing the same 佳能株式会社 2024-03-19 CN disclosed
US-20240053691-A1 TONER AND METHOD FOR PRODUCING TONER CANON KABUSHIKI KAISHA (JP) 2024-02-15 US disclosed
EP-0985692-A2 Improved MBS impact modifier ROHM AND HAAS COMPANY (US) 2000-03-15 EP disclosed
EP-0677537-B1 Process for preparing high-molecular weight acrylamide polymer MITSUI CHEMICALS INC (JP) 1999-01-07 EP disclosed
US-5668229-A REDOX POLYMERIZATION PROCESS WITH OXIDIZERS OF PERSUFATES, HYDROGEN PEROXIDE, METAL PEROXIDE, HYDROPEROXIDES, DIALKYL PEROXIDES, DIACYL PEROXIDES, KETONE PEROXIDES, DIALKYLPEROXY DICARBONATES, PERACIDS, PERESTERS OF MOLECULAR WEIGHT MITSUI TOATSU CHEMICALS, INC. (JP) 1997-09-16 US disclosed
EP-0490269-B1 Graft copolymer and process for producing the same IDEMITSU KOSAN CO (JP) 1996-02-28 EP disclosed
EP-0677537-A1 Process for preparing high-molecular weight acrylamide polymer MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-10-18 EP disclosed
US-5250629-A Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts IDEMITSU KOSAN CO., LTD. (JP) 1993-10-05 US disclosed
EP-0490269-A1 Graft copolymer and process for producing the same IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-06-17 EP disclosed
US-4264755-A FROM STYRENE AND AN UNSATURATED POLYOL ETHER FOR USE IN MAKING POLYURETHANES MOBAY CHEMICAL CORPORATION (US) 1981-04-28 US disclosed