SCHEMBL491994

SCHEMBL491994

Cc1ccc(S(=O)(=O)OC(C)c2ccccc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 1/20 0.45
HTT P42858 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
CYP2D6 P10635 2/20 0.42
MAPK1 P28482 1/20 0.42
CA12 O43570 2/20 0.42
CA9 Q16790 2/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
ALDH1A1 P00352 4/20 0.42
KDM4E B2RXH2 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
MAPT P10636 1/20 0.42
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
CNR2 P34972 1/20 0.41
GAA P10253 2/20 0.41
NPY2R P49146 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11988007 1.00 VDR (0.45) VDRHTTSMN1; SMN2CYP2D6MAPK1
SCHEMBL7637176 0.91 GAA (0.45) VDRHTTSMN1; SMN2CA12CA9
SCHEMBL18037162 0.91 VDR (0.41) VDRHTTSMN1; SMN2CA12CA9
SCHEMBL2476595 0.89 HCAR2 (0.40) SMN1; SMN2MAPK1ALDH1A1KDM4ETDP1
SCHEMBL28646777 0.85 HTT (0.44) VDRHTTALDH1A1KDM4ETDP1
SCHEMBL6762680 0.84 VDR (0.46) VDRHTTSMN1; SMN2CYP2D6MAPK1
SCHEMBL9475352 0.84 VDR (0.46) VDRHTTSMN1; SMN2CYP2D6MAPK1
SCHEMBL7635691 0.83 ACHE (0.42) VDRHTTALDH1A1MAPTGAA
SCHEMBL16344772 0.83 KMT2A (0.43) VDRHTTSMN1; SMN2CA12CA9
SCHEMBL28626138 0.83 ALDH1A1 (0.42) VDRHTTSMN1; SMN2CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6326122-B1 HEAT SENSITIVE ELEMENTS MITSUBISHI CHEMICAL CORPORATION (JP) 2001-12-04 US claimed
EP-4284802-A1 SMALL MOLECULE INHIBITORS OF SALT INDUCIBLE KINASES Janssen Biotech, Inc. (US) 2023-12-06 EP disclosed
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
EP-2019818-B1 PROCESS FOR THE PRODUCTION OF COMPOUNDS VIA HAZARDOUS INTERMEDIATES IN A SERIES OF MICROREACTORS DPX HOLDINGS BV (NL) 2020-03-18 EP disclosed
US-9896599-B2 Process for preparing poly(benzoxazines) 3M INNOVATIVE PROPERTIES COMPANY (US) 2018-02-20 US disclosed
US-9895454-B2 Metal oxide catalyzed radiofluorination THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2018-02-20 US disclosed
US-9895454-B2 Metal oxide catalyzed radiofluorination THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2018-02-20 US disclosed
US-9895454-B2 Metal oxide catalyzed radiofluorination THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2018-02-20 US disclosed
US-20020146635-A1 Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2002-10-10 US disclosed
US-6410207-B1 USING ALKALI DEVELOPER MITSUBISHI CHEMICAL CORPORATION (JP) 2002-06-25 US disclosed
US-6326122-B1 HEAT SENSITIVE ELEMENTS MITSUBISHI CHEMICAL CORPORATION (JP) 2001-12-04 US disclosed
EP-0823327-A2 Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate Mitsubishi Chemical Corporation (JP) 1998-02-11 EP disclosed
US-5446011-A Imagewise coloring when heating; mixture of n-substituted indole, aromatic polyhydroxy compound, carbonyl compound and an acid RICOH COMPANY, LTD. (JP) 1995-08-29 US disclosed
US-5328944-A Heat resistant polymers LOCTITE CORPORATION (US) 1994-07-12 US disclosed
US-4752621-A Arylalkyl amines useful for lowering intraocular pressure SYNTEX (U.S.A.) INC. (US) 1988-06-21 US disclosed
US-4642378-A Arylalkyl amines useful for lowering intraocular pressure SYNTEX (U.S.A.) INC. (US) 1987-02-10 US disclosed
EP-0086678-B1 PROCESS FOR THE PREPARATION OF 2-ACYL-1,3,4,6,7,11B-2H-HEXAHYDRO-4-PYRAZINO(2,1-A)ISOQUINOLINONES AND INTERMEDIATES ELF SANOFI (FR) 1985-07-03 EP disclosed
EP-0086678-A1 Process for the preparation of 2-acyl-1,3,4,6,7,11b-2H-hexahydro-4-pyrazino(2,1-a)isoquinolinones and intermediates ELF SANOFI (FR) 1983-08-24 EP disclosed