SCHEMBL4922320

SCHEMBL4922320

FC(F)(Cl)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)Cl

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
CYP2E1 P05181 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL632568 1.00 ALDH1A1 (0.30) ALDH1A1LMNACYP2E1TSHR
SCHEMBL5729793 0.94 ALDH1A1 (0.33) ALDH1A1LMNACYP2E1TSHR
SCHEMBL1990770 0.89 ALDH1A1 (0.30) ALDH1A1LMNACYP2E1TSHR
SCHEMBL248576 0.87 LMNA (0.47) LMNA
SCHEMBL11693903 0.87 LMNA (0.47) LMNA
SCHEMBL6846353 0.87 LMNA (0.47) LMNA
SCHEMBL8749128 0.87
SCHEMBL8699051 0.87 LMNA (0.47) LMNA
SCHEMBL8675830 0.87 LMNA (0.47) LMNA
SCHEMBL6742202 0.87 LMNA (0.47) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115960609-B Etching solution for etching oxide layer on surface of wafer with high selectivity, preparation method and application thereof 浙江奥首材料科技有限公司 2023-10-24 CN claimed
CN-115960609-A Etching solution for etching oxide layer on surface of wafer with high selectivity, preparation method and application thereof 浙江奥首材料科技有限公司 2023-04-14 CN claimed
CN-112251020-A Wear-resistant tire rubber material and preparation method thereof 王玉龙 2021-01-22 CN claimed
EP-4276929-A1 ELECTROLYTE COMPOSITION Belenos Clean Power Holding AG (CH) 2023-11-15 EP disclosed
CN-117039148-A Electrolyte composition 贝伦诺斯清洁电力控股有限公司 2023-11-10 CN disclosed
CN-115960609-B Etching solution for etching oxide layer on surface of wafer with high selectivity, preparation method and application thereof 浙江奥首材料科技有限公司 2023-10-24 CN disclosed
US-20230253628-A1 ELECTROLYTE COMPOSITION BELENOS CLEAN POWER HOLDING AG (CH) 2023-08-10 US disclosed
CN-115960609-A Etching solution for etching oxide layer on surface of wafer with high selectivity, preparation method and application thereof 浙江奥首材料科技有限公司 2023-04-14 CN disclosed
CN-112251020-A Wear-resistant tire rubber material and preparation method thereof 王玉龙 2021-01-22 CN disclosed
EP-1740189-B1 LUNG SURFACTANT SUPPLEMENTS CENTRE NAT RECH SCIENT (FR) 2012-06-13 EP disclosed
US-20080019926-A1 Lung Surfactant Supplements UNIVERSITE LOUIS PASTEUR INDUSTRIE (FR) 2008-01-24 US disclosed
EP-1740189-A1 LUNG SURFACTANT SUPPLEMENTS CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) 2007-01-10 EP disclosed
WO-2005099718-A1 LUNG SURFACTANT SUPPLEMENTS CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) 2005-10-27 WO disclosed